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Atomic fluorescence mapping of optical field intensity profiles issuing from nanostructured slits, milled into subwavelength metallic layers

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Abstract

We report on a direct spatial profile measurement of optical field intensity issuing from subwavelength slits flanked by periodic grooves and fabricated on a thin metallic layer. This type of structure is of interest for the manipulation of cold atoms by optical potentials near surfaces.

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Author notes

  1. B. Viaris de Lesegno

    Present address: Laboratoire Aimé Cotton, Campus d’Orsay, 91405, Orsay, France

  2. H.J. Lezec

    Present address: Thomas J. Watson Laboratories of Applied Physics, California Institute of Technology, Pasadena, California, 91125, USA

Authors and Affiliations

  1. IRSAMC/LCAR, Université Paul Sabatier, 118 route de Narbonne, 31062, Toulouse, France

    G. Gay, B. Viaris de Lesegno, R. Mathevet & J. Weiner

  2. ISIS, Université Louis Pasteur, 8 allée Gaspard Monge, 67083, Strasbourg, France

    H.J. Lezec & T.W. Ebbesen

Authors
  1. G. Gay
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  2. B. Viaris de Lesegno
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  3. R. Mathevet
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  4. J. Weiner
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  5. H.J. Lezec
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  6. T.W. Ebbesen
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Corresponding author

Correspondence to J. Weiner.

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PACS

32.50.+d; 42.79.Gn

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Gay, G., Viaris de Lesegno, B., Mathevet, R. et al. Atomic fluorescence mapping of optical field intensity profiles issuing from nanostructured slits, milled into subwavelength metallic layers. Appl. Phys. B 81, 871–874 (2005). https://doi.org/10.1007/s00340-005-2016-x

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  • DOI: https://doi.org/10.1007/s00340-005-2016-x

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