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High-resolution analytical electron microscopy of catalytically etched silicon nanowires

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Abstract

We report on the characterization of hexagonally ordered, vertically aligned silicon nanowires (SiNW) by means of analytical transmission electron microscopy. Combining colloidal lithography, plasma etching, and catalytic wet etching arrays of SiNW of a sub-50 nm diameter with an aspect ratio of up to 10 could be fabricated. Scanning transmission electron microscopy has been applied in order to investigate the morphology, the internal structure, and the composition of the catalytically etched SiNW. The analysis yielded a single-crystalline porous structure composed of crystalline silicon, amorphous silicon, and SiO x with x≤2.

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Authors and Affiliations

  1. Interdisziplinäres Zentrum für Materialwissenschaften, Martin-Luther-Universität Halle-Wittenberg, 06099, Halle, Germany

    M. Schade, N. Geyer, B. Fuhrmann, F. Heyroth & H. S. Leipner

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  1. M. Schade
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  2. N. Geyer
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  3. B. Fuhrmann
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  4. F. Heyroth
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  5. H. S. Leipner
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Correspondence to M. Schade.

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Schade, M., Geyer, N., Fuhrmann, B. et al. High-resolution analytical electron microscopy of catalytically etched silicon nanowires. Appl. Phys. A 95, 325–327 (2009). https://doi.org/10.1007/s00339-009-5101-x

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  • DOI: https://doi.org/10.1007/s00339-009-5101-x

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