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Maskless nonlinear lithography with femtosecond laser pulses

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Abstract

Development of maskless lithography techniques can provide a potential solution for the photomask cost issue. Furthermore, it could open a market for small-scale manufacturing applications. Since femtosecond lasers have been found suitable for processing of a wide range of materials with sub-micrometer resolution – whereas the limit of achievable structure sizes is predicted to be below 100 nm – it is attractive to use this technique for maskless lithography. In this paper, we present the first results on super-resolution femtosecond laser lithography, which show great potential for future applications.

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Authors and Affiliations

  1. Laser Zentrum Hannover e.V., Hollerithallee 8, 30419, Hannover, Germany

    J. Koch, E. Fadeeva, M. Engelbrecht, A. Ostendorf & B.N. Chichkov

  2. Institute for Microtechnology, Hanover University, Schönebecker Allee 2, 30823, Garbsen, Germany

    C. Ruffert & H.H. Gatzen

Authors
  1. J. Koch
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  2. E. Fadeeva
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  3. M. Engelbrecht
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  4. C. Ruffert
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  5. H.H. Gatzen
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  6. A. Ostendorf
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  7. B.N. Chichkov
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Corresponding author

Correspondence to J. Koch.

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PACS

42.62.-b; 52.38.Mf; 85.40.Hp

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Koch, J., Fadeeva, E., Engelbrecht, M. et al. Maskless nonlinear lithography with femtosecond laser pulses. Appl. Phys. A 82, 23–26 (2006). https://doi.org/10.1007/s00339-005-3418-7

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  • DOI: https://doi.org/10.1007/s00339-005-3418-7

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