Abstract
Heterolayer memristive systems with a functional aluminum oxide layer obtained by the method of atomic layer deposition are studied. A method is proposed for the arrangement of a reservoir of oxygen vacancies, which ensures the creation of a wide memory window. The proposed method uses oxygen permeable platinum electrodes in combination with an amorphous-silicon-dioxide adsorption sublayer formed by plasma-chemical deposition under the bottom electrode of the structure. It is shown that an amorphous-silicon-dioxide sublayer can play, under certain conditions, the role of a reservoir of oxygen vacancies for the functional sublayer, which provides a reversible change in the concentration of molecular oxygen in the regions adjacent to the electrodes and reversible readjustment of the resistivity of the structure within the range of seven orders of magnitude.
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This study was supported by the Ministry of Science and Higher Education of the Russian Federation within State assignment FSEE-2020-0013 in the field of research activity.
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Translated by O. Kadkin
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Andreeva, N.V., Romanov, A.A., Mazing, D.S. et al. Heterolayer Memristive Systems for Multibit Memory: The Role of a Reservoir of Oxygen Vacancies. Nanotechnol Russia 16, 790–797 (2021). https://doi.org/10.1134/S2635167621060033
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DOI: https://doi.org/10.1134/S2635167621060033