Abstract
Analytical expressions describing the dependences of the p +–n-junction leakage current on the doping level of the p +-type region are derived by taking into account a whole set of nonlinear physical effects: electron–hole scattering, Auger recombination, band-gap narrowing, and nonlinear dependences of the charge-carrier lifetime and mobility on the doping level. It is shown that the dependence for the leakage current has a minimum at which the injection ability of the p +-type emitter is at a maximum. The dependence of the extremum position on the main parameters of the heavily doped p + layer is analyzed. The data obtained make it possible to optimize the structure of high-power silicon devices and to facilitate the adequacy of numerical calculations.
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Original Russian Text © T.T. Mnatsakanov, M.E. Levinshtein, V.B. Shuman, B.M. Seredin, 2017, published in Fizika i Tekhnika Poluprovodnikov, 2017, Vol. 51, No. 6, pp. 830–834.
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Mnatsakanov, T.T., Levinshtein, M.E., Shuman, V.B. et al. On the limit of the injection ability of silicon p +–n junctions as a result of fundamental physical effects. Semiconductors 51, 798–802 (2017). https://doi.org/10.1134/S1063782617060227
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DOI: https://doi.org/10.1134/S1063782617060227