Abstract
The measured dependences of the equivalent plasma resistance on the external magnetic field (0–50 G) in a 46-cm-diameter RF inductive plasma source operating at frequencies of 2, 4, and 13.56 MHz and a power of 100–500 W are presented. The experiments were carried out in argon at pressures of 0.1–30 mTorr. The presence of the external magnetic field leads to the appearance of resonance domains of efficient RF power absorption corresponding to the conditions of resonance excitation of helicons coupled with Trivelpiece–Gould modes. It is shown that RF power absorption at frequencies of 2 MHz can be optimized by applying an external magnetic field corresponding to the domains of resonance absorption. The effect is enhanced with increasing operating frequency.
Similar content being viewed by others
References
M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, Hoboken, NJ, 2005).
P. Chabert and N. Braithwaite, Physics of Radio-Frequency Plasmas (Cambridge Univ. Press, Cambridge, 2011).
V. M. Donnelly and A. Kornblit, J. Vac. Sci. Technol. A 31, 050825 (2013).
F. F. Chen, in High-Density Plasma Sources: Design, Physics, and Performance, Ed. by O. A. Popov (Noyes, Park Ridge, NJ, 1996), p. 1.
H. Conrads and M. Schmidt, Plasma Sources Sci. Technol. 9, 441 (2000).
J. Hopwood, Plasma Sources Sci.Technol. 1, 109 (1992).
V. A. Galperin, E. V. Danilkin, and A. I. Mochalov, Processes of Plasma Etching in Micro-and Nanotechnologies (BINOM, Moscow, 2010) [in Russian].
R. B. Piejak, V. A. Godyak, and B. M. Alexandrovich, Plasma Sources. Sci.Technol. 1, 179 (1992).
V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, J. Appl. Phys. 85, 703 (1999).
V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, Plasma Sources. Sci. Technol. 3, 169 (1994).
K. V. Vavilin, A. A. Rukhadze, M. Kh. Ri, and V. Yu. Plaksin, Plasma Phys. Rep. 30, 687 (2004).
A. F. Aleksandrov, G. E. Bugrov, K. V. Vavilin, I. F. Kerimova, S. G. Kondranin, E. A. Kral’kina, V. B. Pavlov, V. Yu. Plaksin, and A. A. Rukhadze, Plasma Phys. Rep. 30, 398 (2004).
E. A. Kral’kina, Phys. Usp. 51, 493 (2008).
E. A. Kralkina, A. A. Rukhadze, V. B. Pavlov, K. V. Vavilin, P. A. Nekliudova, A. K. Petrov, and A. F. Alexandrov, Plasma Sources Sci. Technol. 25, 015016 (2016).
E. A. Kralkina, P. A. Nekliudova, V. B. Pavlov, and K. V. Vavilin, Moscow Univ. Phys. Bull. 69 (1), 92 (2014).
Author information
Authors and Affiliations
Corresponding author
Additional information
Original Russian Text © P.A. Nekliudova, E.A. Kralkina, K.V. Vavilin, I.I. Zadiriyev, A.M. Nikonov, 2017, published in Prikladnaya Fizika, 2017, No. 4, pp. 27–31.
Rights and permissions
About this article
Cite this article
Nekliudova, P.A., Kralkina, E.A., Vavilin, K.V. et al. Effect of an External Magnetic Field on the Absorption Efficiency of the RF Power in a Spatially Bounded Inductive Plasma Source. Plasma Phys. Rep. 44, 878–881 (2018). https://doi.org/10.1134/S1063780X18090088
Received:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S1063780X18090088