Skip to main content
Log in

In situ IR Absorption Measurements as Diagnostics in Plasma Polymerization

  • Commentary
  • Published:
Plasmas and Polymers

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

REFERENCES

  1. G. Hancock, Laser induced fluorescence diagnostics in polymer deposition and processing, Plasmas and Polymers 2, 71 (1997).

    Google Scholar 

  2. N. B. Colthup, L. H. Daly, and S. E. Wiberley, Introduction to Infrared and Raman Spectroscopy, Academic Press, San Diego, (1990).

    Google Scholar 

  3. J. M. Hollas, Modern Spectroscopy, John Wiley and Sons, Chichester, (1996).

    Google Scholar 

  4. Y. Segui and P. Raynaud, Plasma diagnostic by infrared absorption spectroscopy, in Plasma Processing of Polymers, R. d'Agostino, P. Favia, and F. Fracassi eds., NATO ASI Series E: Applied Sciences Kluwer Academic Publishers, Dordrecht, 346, 81 (1997).

    Google Scholar 

  5. T. A. Cleland and D. W. Hess, Measurements of rotational temperature and dissociation in N2O glow discharges using Fourier transform infrared spectroscopy, J. Appl. Phys. 64, 1068 (1988).

    Google Scholar 

  6. G. M. W. Kroesen, J. H. W. G. den Boer, L. Boufendi, F. Vivet, M. Khouli, A. Bouchoule and F. J. deHoog, In situ infrared absorption spectroscopy of dusty plasmas, J. Vac. Sci. Technol. A14, 546 (1996).

    Google Scholar 

  7. Ch. Hollenstein, A. A. Howling, C. Courteille, D. Magni, S. Scholz, G. M. W. Kroesen, N. Simons, W. de Zeeuw, and W. Schwarzenbach, Silicon oxide particle formation in RF plasmas investigated by infrared absorption spectroscopy and mass spectrometry, Plasmas Sources, Sci. Technol. 31, 74 (1998).

    Google Scholar 

  8. P. W. Morrison and J. R. Haigis, In situ infrared measurements of film and gas properties during the plasma deposition of amorphous hydrogenated silicon, J. Vac. Sci. Technol. A11 490 (1993).

    Google Scholar 

  9. A. Campargue, M. Chenevier, L. Fayette, B. Marcus, M. Mermoux and A. J. Ross, Fourier transform diagnostics of gaseous species during microwave assisted diamond deposition, App. Phys. Lett. 62, 134 (1993).

    Google Scholar 

  10. J. A. O'Neill, J. Singh, and G. G. Gifford, In situ infrared diagnostics of particle forming etch plasmas, J. Vac. Sci. Technol. A8, 1716 (1990).

    Google Scholar 

  11. Y. Segui, Plasma deposition from organosilicon monomers, in Plasma Processing of Polymers, R. d'Agostino, P. Favia, and F. Fracassi eds., NATO ASI Series E: Kluwer Academic Publishers, Dordrecht, 346, 305 (1997).

    Google Scholar 

  12. P. Raynaud, Y. Segui, G. Balmer, A. Boulanger, and R. R. Burke, Infrared absorption of the products formed in distributed electron cyclotron resonance plasmas of hexamethyldisiloxane and tetraethoxysilane, J. Phys. D:Appl. Phys. 30, L23 (1997).

    Google Scholar 

  13. K. Taschibana, N. Nishida, H. Harima, and Y. Urano, Diagnostics and modeling of a methane plasma used in the chemical vapor deposition of amorphous carbon films, J. Phys. D 17, 1727 (1984).

    Google Scholar 

  14. L. Sansonnens, A. A. Howling, and Ch. Hollenstein, Degree of dissociation measured by FTIR absorption spectroscopy applied to VHF silane plasmas, Plasma Sources Sci. Technol. 7, 114 (1998).

    Google Scholar 

  15. C. Courteille, D. Magni, Ch. Deschenaux, P. Fayet, A. A. Howling, and Ch. Hollenstein, Gas phase and particle diagnostics of HMDSO plasmas by infrared absorption spectroscopy, 41th Ann. Tech. Conf. Proc. Society of Vacuum Coaters, (1998), p. 327.

  16. Ch. Deschenaux, Investigations of CH4, C2H2 and C2H4 RF plasmas by means of FTIR absorption spectroscopy and mass spectrometry, J. Phys D: Appl. Phys 32, 1876 (1999).

    Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Rights and permissions

Reprints and permissions

About this article

Cite this article

Hollenstein, C. In situ IR Absorption Measurements as Diagnostics in Plasma Polymerization. Plasmas and Polymers 3, 249–256 (1998). https://doi.org/10.1023/A:1021806922443

Download citation

  • Issue Date:

  • DOI: https://doi.org/10.1023/A:1021806922443

Navigation