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Ryu, H.W., Choi, G.P., Lee, W.S. et al. Preferred orientations of NiO thin films prepared by RF magnetron sputtering. Journal of Materials Science 39, 4375–4377 (2004). https://doi.org/10.1023/B:JMSC.0000033431.52659.e5
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DOI: https://doi.org/10.1023/B:JMSC.0000033431.52659.e5