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In-situ stitching interferometric test system for large plano optics

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Abstract

In-situ testing is an ideal technology for improving the precision and efficiency of fabrication. We developed an in-situ subaperture stitching interferometric test system for large plano optics in the workshop environment with high precision and satisfactory repeatability. In this paper, we provide a brief account of this system and the principle of in-situ subaperture stitching measurement. Several validation tests are presented, which demonstrate that the developed system is capable of realizing in-situ testing. The size of optical flats can be measured is up to 420 mm × 780 mm, and repeatability is smaller than 0.03λ. The paper also discusses the necessary requirements for a suitable workshop environment for ensuring that the tests are stable and reliable.

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Acknowledgements

The authors greatly acknowledge Prof. Ming-Yi Chen from Shanghai University for his enlightening discussions. This work was supported by the National Natural Science Foundation of China (Grant No. 51775326) and the National Key Research and Development Project (Grant No. 2016YFF0101905).

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Correspondence to Ying-Jie Yu.

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Wu, X., Yu, YJ., Mou, KB. et al. In-situ stitching interferometric test system for large plano optics. Adv. Manuf. 6, 195–203 (2018). https://doi.org/10.1007/s40436-018-0220-2

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  • DOI: https://doi.org/10.1007/s40436-018-0220-2

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