Abstract
Si nanorod arrays exhibit promising potential applications in many fields compared with the bulk counterpart. Therefore, development of a facile and cost-effective method for the fabrication of this kind of nanostructures is essential to enabling a wide range of advanced technologies in electronics and optics. In this paper, a simple and low cost method is presented and the fabrication process includes a combination of polystyrene sphere lithography and metal-assisted chemical etching. Compared with previously reported polystyrene sphere lithography methods, present fabrication has the advantage of simplicity. In addition, the fabrication involves no reactive ion etching equipment or noble metal deposition facilities. Based on the experimental results, a plausible mechanism is proposed to explain the formation of Si nanorod arrays.
Similar content being viewed by others
References
F. Wang, X. Zhang, L. Wang, Y. Jiang, C. Wei, Y. Zhao, J. Power Source 293, 698 (2015)
A.G. Nassiopoulou, V. Gianneta, C. Katsogridakis, Nanoscale Res. Lett. 6, 597 (2011)
R. Liu, F. Zhang, C. Con, B. Cui, B. Sun, Nanoscale Res. Lett. 8, 155 (2013)
Y. Liu, W. Sun, Y. Jiang, X.Z. Zhao, Mater. Lett. 139, 437 (2015)
J. Yeom, D. Ratchford, C.R. Field, T.H. Brintlinger, P.E. Pehrsson, Adv. Funct. Mater. 24, 106 (2014)
J. Zhao, M.T. Sun, Z. Liu, B.G. Quan, C.Z. Gu, J.J. Li, Sci. Rep. 5, 16019 (2015)
L. Wang, F. Wang, X. Zhang, N. Wang, Y. Jiang, Q. Hao, Y. Zhao, J. Power Sources 268, 619 (2014)
M. Rosa, M. Allegrezza, M. Canino, C. Summonte, A. Desalvo, Sol. Energy Mater. Sol. Cells 95, 2987 (2011)
H. Asoh, K. Uchibori, S. Ono, Semicond. Sci. Technol. 26, 102001 (2011)
Y. Wang, L. Yang, Y. Liu, Z. Mei, W. Chen, J. Li, H. Liang, A. Kuznetsov, X.L. Du, Sci. Rep. 5, 10843 (2015)
Y. Lee, H. Kim, S.Q. Hussain, S. Han, N. Balaji, Y.J. Lee, J. Lee, J. Yi, Mater. Sci. Semicond. Process. 40, 391 (2015)
J. Cichoszewski, M. Reuter, F. Schwerdt, J. Werner, Electrochim. Acta 109, 333 (2013)
X. Li, Y. Xiao, C. Yan, J.W. Song, V. Talalaev, S.L. Schweizer, K. Piekielska, A. Sprafke, J.H. Lee, R.B. Wehrspohn, Electrochim. Acta 94, 57 (2013)
H. Asoh, K. Fujihara, S. Ono, Nanoscale Res. Lett. 8, 1 (2013)
H. Song, W. Zhang, C. Cheng, Y. Tang, L. Luo, X. Chen, C. Luan, X. Meng, J. Zapien, N. Wang, Cryst. Growth Des. 11, 147 (2010)
M. Geissler, Y. Xia, Adv. Mater. 16, 1249 (2004)
L.J. Guo, Adv. Mater. 19, 495 (2007)
B. Mikhael, B. Elise, M. Xavier, S. Sebastian, M. Johann, P. Laetitia, A.C.S. Appl, Mater. Interfaces 3, 3866 (2011)
P.R. Pudasaini, F. Ruiz-Zepeda, M. Sharma, D. Elam, A. Ponce, A.A. Ayon, A.C.S. Appl, Mater. Interfaces 5, 9620 (2013)
K. Peng, M. Zhang, A. Lu, N.B. Wong, R. Zhang, S.T. Lee, Appl. Phys. Lett. 90, 163123 (2007)
Z. Huang, N. Geyer, P. Werner, J. De Boor, U. Gösele, Adv. Mater. 23, 285 (2011)
K. Peng, H. Fang, J. Hu, Y. Wu, J. Zhu, Y. Yan, S. Lee, Chem. Eur. J. 12, 7942 (2006)
Acknowledgments
This work was partially supported by the National Natural Science Foundation of China (51202081).
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Zhu, Y.F., Zhou, L., Pan, C.J. et al. Fabrication of silicon nanorod arrays via a facile metal-assisted chemical etching method. J Mater Sci: Mater Electron 27, 5833–5838 (2016). https://doi.org/10.1007/s10854-016-4499-0
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10854-016-4499-0