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Growth of a textured quasicrystalline phase in Ti-Ni-Zr films prepared by pulsed laser deposition

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The preparation in thin film form of the known icosahedral phase in Ti-Ni-Zr bulk alloys has been investigated as a function of substrate temperature. Films were deposited by pulsed laser deposition on sapphire substrates at temperatures ranging from room temperature to 350 °C. Morphological and structural modifications have been followed by grazing-incidence and θ–2θ X-ray diffraction, transmission electron diffraction and imaging. Chemical composition has been analyzed by electron probe microanalysis. The in-depth variation of composition has been studied by secondary neutral mass spectroscopy. We show that pulsed laser deposition at 275 °C makes the formation of a 1-μm-thick film of Ti-Ni-Zr quasicrystalline textured nanocrystallites possible.

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Received: 7 June 2001 / Accepted: 18 February 2002 / Published online: 3 June 2002

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Brien, V., Dauscher, A., Weisbecker, P. et al. Growth of a textured quasicrystalline phase in Ti-Ni-Zr films prepared by pulsed laser deposition . Appl Phys A 76, 187–195 (2003). https://doi.org/10.1007/s003390201405

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  • DOI: https://doi.org/10.1007/s003390201405

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