Skip to main content
SpringerLink
Log in

Cavity ring-down spectroscopy of CH and CD radicals in a diamond thin film chemical vapor deposition reactor

  • Invited paper
  • Published:
Applied Physics A Aims and scope Submit manuscript

Abstract.

A mixture of H2 and CH4 is passed over a hot-wire tungsten filament in a diamond thin film chemical vapor deposition reactor. The resulting CH radicals are measured in absorption using cavity ring-down spectroscopy (CRDS). The concentration of the CH radicals increases as the filament is approached. The rotational temperature measurements indicate a large temperature discontinuity between the filament and the CH in the gas phase. The pathways for CH production were investigated by replacing H2 by D2 in the feed gas mixture, which resulted in the exclusive production of CD. From this observation it is concluded that rapid H/D isotope exchange dominates in the gas phase. Nonperiodic temporal oscillations in the CH concentration are observed when a rhenium filament is used in place of a tungsten filament. The oscillations are attributed to the nonperiodic changes in the amount of carbon at the filament surface.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

Author information

Authors and Affiliations

  1. Department of Chemistry, Stanford University, Stanford, CA 94305, USA, , , , , , US

    U. Lommatzsch, D. Aderhold & R.N. Zare

  2. Department of Mechanical Engineering, Stanford University, Stanford, CA 94305, USA, , , , , , US

    E.H. Wahl, T.G. Owano & C.H. Kruger

Authors
  1. U. Lommatzsch
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. E.H. Wahl
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. D. Aderhold
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. T.G. Owano
    View author publications

    You can also search for this author in PubMed Google Scholar

  5. C.H. Kruger
    View author publications

    You can also search for this author in PubMed Google Scholar

  6. R.N. Zare
    View author publications

    You can also search for this author in PubMed Google Scholar

Additional information

Received: 21 August 2000 / Accepted: 23 August 2000 / Published online: 23 May 2001

Rights and permissions

Reprints and permissions

About this article

Cite this article

Lommatzsch, U., Wahl, E., Aderhold, D. et al. Cavity ring-down spectroscopy of CH and CD radicals in a diamond thin film chemical vapor deposition reactor . Appl Phys A 73, 27–33 (2001). https://doi.org/10.1007/s003390100699

Download citation

  • Issue Date:

  • DOI: https://doi.org/10.1007/s003390100699

Search

Navigation