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Changes in the etch rate of photosensitive polymers as a function of the pulse number

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Abstract

The ablation rates of a polyimide and a triazene polymer were studied gravimetrically by a quartz micro balance for 248-nm and 308-nm irradiation. Special care was taken to examine the dependence of the ablation rate at constant fluences for single pulses and the influence of consecutive pulses at the same position. A clear trend was observed in these measurements, i.e., that the mass loss after the first pulse is always different from values for the following pulses. This implies that it is very difficult to determine true ablation rates, which are the foundation of most ablation models. The differences of the mass loss between the first pulse and the following pulses is most probably due to carbonization of the material, resulting in varying ablation rates for the following pulses. The ablation rates are thus not a real material property but a superposition of the material ablation rates with the ablation rates of carbon and carbonized material.

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Correspondence to T. Lippert.

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52.38.Mf; 71.20.Rv; 07.10.Lw

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Dumont, T., Lazare, S., Lippert, T. et al. Changes in the etch rate of photosensitive polymers as a function of the pulse number. Appl. Phys. A 79, 1271–1274 (2004). https://doi.org/10.1007/s00339-004-2734-7

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  • DOI: https://doi.org/10.1007/s00339-004-2734-7

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