Abstract
a-C∶H films have been deposited from methane in a 20 KHz discharge. The Current Voltage characteristics of the plasma have been plotted as a function of the CH4 pressure. It was shown that below 0.1 mbar the graphitic content in the films estimated from Raman Spectroscopy and Electron Energy Loss Spectroscopy is high enough to give electrical conductivity controlled by a percolation mechanism. It was also found that the a:c electrical responses of the deposited films are more sensitive to the structure than any other chemical analysis. The electrical analysis might be a good tool for structural investigations on a-C∶H films.
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Segui, Y., Mebarki, B., Laurent, C. et al. Structure and electrical properties of a-C∶H films deposited from CH4 decomposition in a low frequency discharge. Plasma Pol 1, 153–172 (1996). https://doi.org/10.1007/BF02532824
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DOI: https://doi.org/10.1007/BF02532824