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Contact mechanics of a flexible imprinter for photocured nanoimprint lithography

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A flexible imprinter can be used to accommodate substrate or template roughness in nanoimprint lithography. The contact mechanics of a multi-layer imprinter incorporating bending and local deformation is described. With the right combination of dimensions, moduli, and viscosity, the imprinter can transfer a pattern evenly to a non-flat substrate. These concepts have been used to pattern magnetic media for high density information storage.

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Author notes

  1. K.R. Carter

    Present address: Department of Polymer Science and Engineering, University of Massachusetts, 01003, USA

Authors and Affiliations

  1. IBM Research Division, Almaden Research Center, 650 Harry Road, San Jose, CA, 95120, USA

    G.M. McClelland, C.T. Rettner, M.W. Hart, K.R. Carter & M.I. Sanchez

  2. Hitachi Global Storage Technologies, San Jose Research Center, San Jose, CA, 95120, USA

    M.E. Best & B.D. Terris

Authors
  1. G.M. McClelland
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  2. C.T. Rettner
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  3. M.W. Hart
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  4. K.R. Carter
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  5. M.I. Sanchez
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  6. M.E. Best
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  7. B.D. Terris
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Correspondence to G.M. McClelland.

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McClelland, G., Rettner, C., Hart, M. et al. Contact mechanics of a flexible imprinter for photocured nanoimprint lithography. Tribol Lett 19, 59–63 (2005). https://doi.org/10.1007/s11249-005-4265-6

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  • DOI: https://doi.org/10.1007/s11249-005-4265-6

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