Abstract
This chapter describes different approaches to make engineered films based on polymeric substrates with ultralow water and oxygen permeation. These films are compatible with encapsulation of OLED devices for display and lighting applications. A survey of current technologies and modes of application of these films is presented. The properties of substrates and planarization layers necessary to achieved ultra-barrier performance are discussed. Advantages and limitation of deposition techniques used in the formation of the inorganic films are discussed by presenting and comparing physical vapor deposition (PVD) by sputtering, plasma-enhanced chemical vapor deposition (PECVD), and atomic layer deposition (ALD). An innovative approach based on the deposition of an inorganic film by wet method is discussed in the last session.
References
Affinito J (2002) Polymer film deposition by new vacuum process. Proc 45th Ann Tech Conf SVC, pp 425–439
Affinito JD, Eufinger S, Gross ME, Graff GL, Martin PM (1997) PML/oxide/PML barrier layer performance differences arising from use of UV or electron beam polymerization of the PML layers. Thin Solid Films 308–309:19–25
Affinito JD, Graff GL, Shi K, Gross ME, Mousier PA, Hall MG (1999) A new hybrid deposition process, combining PML and PECVD, for high rate plasma polymerization of low vapor pressure and solid, monomer precursors. In: Proc 42nd Ann Tech Conf SVC, pp 102–107
Akron Polymer Systems, Inc. 62 N. Summit St. Akron, OH 44308 USA
Anders A (2006) Physics of arcing and implication to sputter deposition. Thin Solid Films 502:22–28
APTIV® Films. Victrex Technology Centre, Hillhouse International, Thornton Cleveleys, Lancashire FY5 4QD, UK
Bryan L, Danforth BL, Dickey ER (2014) UV-curable top coat protection against mechanical abrasion for atomic layer deposition (ALD) thin film barrier coatings. Surf Coat Technol 241:142–147
Carcia PF, McLean RS, Reilly MH, Groner MD, George SM (2006) Ca test of Al2O3 gas diffusion barriers grown by atomic layer deposition on polymers. Appl Phys Lett 89:031915
Carcia PF, McLean RS, Groner MD, Dameron AA, George SM (2009) Al2O3 ALD and SiN PECVD films as gas diffusion ultra-barrier on polymer substrates. J Appl Phys 106:023533
Coclite AM, Ozaydin-Ince G, Palumbo F, Milella A, Gleason KK (2010) Single-chamber deposition of multilayer barriers by plasma enhanced and initiated chemical vapor deposition of Organosilicones. Plasma Processes Polym 7:561–570
CPI Printable Electronic Centre. NETPark, Thomas Wright way, Sedgefield, County Durham, TS21 3FG, UK
Daalder JE (1976) Components of cathode erosion in vacuum arcs. J Phys D Appl Phys 9:2379
Dameron AA, Davidson SD, Burton BB, Carcia PF, McLean RS, George SM (2008) Gas diffusion barriers on polymers using multilayers fabricated by Al2O3 and rapid SiO2 atomic layer deposition. J Phys Chem C 112:4573–4580
Dickey ER (2012) Advances in roll to roll atomic layer deposition. In: 55th annual technical conference of the Society of Vacuum Coaters, Santa Clara
Dickey ER, Barrow WA (2009) High rate roll-to-roll deposition of ALD thin films on flexible substrates. In: 52nd annual technical conference of the Society of Vacuum Coaters, Santa Clara
Dickey E, Barrow WA (2012) High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films. J Vac Sci Technol A 30:021502
Dickey ER, Barrow WA (2013) Improved stability and moisture barrier performance of mixed oxide ALD films. In: 56th annual technical conference of the Society of Vacuum Coaters, Providence
Erlat AG, Yan M, Duggal AR (2009) Engineered films for display technologies. In: Wong WS, Salleo A (eds) Flexible electronics. Springer, Boston, pp 413–449
Fitzpatrick PR, Gibbs ZM, George SM (2012) Evaluating operating conditions for continuous atmospheric atomic layer deposition using a multiple slit gas source head. J Vac Sci Technol A 30:01A136
Freire MT, Damant AP, Castle L, Reyes FGR (1999) Thermal stability of polyethylene terephthalate (PET): oligomer distribution and formation of volatiles. Packag Technol Sci 12(1):29–36
Frontier Industrial Technology Inc. (2015). http://www.frontierindustrial.com/page.asp?tid=79
Ghosh AP, Gerenser LJ, Jarman CM, Fornalik JE (2005) Thin-film encapsulation of organic light-emitting devices. Appl Phys Lett 86:223503
Graff GL, Burrows PE, Williford RE, Praino RF (2005) In: Crawford GP (ed) Barrier layer technology for flexible displays. Flexible Flat Panel Displays/Wiley, New York, pp 11–33
Holland BJ, Hay JN (2002) Analysis of comonomer content and cyclic oligomers of poly (ethylene terephthalate). Polymer 43:1797–1804
Hong S, Jeon C, Song S, Kim J, Lee J, Kim D, Jeong S, Nam H, Lee J, Yang W, Park S, Tak Y, Ryu J, Kim C, Ahn B, Yeo S (2014) Development of commercial flexible AMOLEDs. Soc Inf Disp Dig 4501:334–337
International Standard ISO. 25178-604 Geometrical product specifications (GPS)-Surface texture: Areal. Part 604 Nominal characteristics of non-contact (coherence scanning interferometry) instruments
Juettner B (1987) Characterization of the cathode spot. IEEE Trans Plasma Sci 15:474–480
Kapton®. DuPont High Performance Films, P.O. Box 89, Route 23 South; and DuPont, Road, Circleville, OH 43113 USA
Kolon Industries. Daiichi Hibiya Bldg 9/F, 18-21, 1-Chome, Shinbashi, Minato-Ku, Tokyo, Japan
Koski K, Holsa J, Juliet P (1999) Surface defects and arc generation in reactive magnetron sputtering of aluminum oxide thin films. Surf Coat Technol 115:163–171
Levy DH, Freeman D, Nelson SF, Cowdery-Corvan PJ, Stable ILM (2008) ZnO thin film transistors by fast open air atomic layer deposition. Appl Phys Lett 192101:92
Levy DH, Nelson SF, Freeman D (2009) Oxide electronics by spatial atomic layer deposition. J Disp Technol 5:484–494
Lexan®. Sabic, One Plastics Avenue, Pittsfield, MA 01201
MacDonald WA (2003) Polyester film. In: Encyclopedia polymer science & technology, 3rd edn. Wiley, Hoboken
MacDonald WA (2005) In: Crawford G (ed) Flexible flat panel displays. Wiley, Hoboken, and references contained therein
MacDonald WA, Mackerron DH, Brooks DW (2002) Chapter. In: Brookes DW (ed) PET packaging technology. Sheffield Academic Press, Sheffield
MacDonald WA, Looney MK, MacKerron D, Eveson R, Adam R, Hashimoto K, Rakos K (2007) Latest advances in substrates for flexible electronics. J SID 15(12):1075–1083
Maixner RD (2002) Future trends in permeation measurement. In: Proceedings of Society of Vacuum Coaters, 45th annual technical conference, pp 461–464
Maydannik PS, Kääriäinen TO, Cameron DC (2011a) An atomic layer deposition process for moving flexible substrates. Chem Eng J 171:345–349
Maydannik PS, Kääriäinen TO, Cameron DC (2011b) Continuous atomic layer deposition: explanation for anomalous growth rate effects. J Vac Sci Technol A 30:01A122
Maydannik PS, Kääriäinen TO, Lahtinen K, Cameron DC, Söderlund M, Soininen P, Johansson P, Kuusipalo J, Moro L, Zeng X (2014) Roll-to-roll atomic layer deposition process for flexible electronics encapsulation applications. J Vac Sci Technol A 32:051603
Maydannik PS, Plyushch A, Sillanpää M, Cameron DC (2015) Spatial atomic layer deposition: performance of low temperature H2O and O3 oxidant chemistry for flexible electronics encapsulation. J Vac Sci Technol A 33:031603
McDonald B, Rollins K, MacKerron RK, Eveson R, Hashimoto K, Rustin B (2005) In: Crawford GP (ed) Engineered films for display technologies. Flexible Flat Panel Displays/Wiley, New York, pp 11–33
Mori T, Goto Y, Takemura C, Hirabayashi K (2014) Development of a barrier film for flexible OLED lighting. Konica Minolta Technol Rep 11:83–87
Morrison NA, Stolley T, Hermanns U, Reus A, Deppisch T, Bolandi H, Melnik Y, Singh V, Griffith-Cruz J (2015) An overview of process & product requirements for next generation thin film electronics, advanced touch panel devices and ultra high barriers. Proc IEEE 103(4): 518–534
Muñoz-Rojas D, MacManus-Driscoll J (2014) Spatial atmospheric atomic layer deposition: a new laboratory and industrial tool for low-cost photovoltaics. Mater Horiz 1:314–320
Nisato G, Bouten PCP, Slikkerveer PJ, Bennett WD, Graff GL, Rutherford N, Wiese L (2001) Evaluating high performance diffusion barriers: the calcium test. In: Proceedings Asia display/IDW, pp 1435–1438
Nisato G, Kuilder M, Bouten P, Moro L, Philips O, Rutherford N (2003) Thin film encapsulation for OLEDs: evaluation of multilayer barriers using the Ca test. In: SID symposium digest of technical papers, vol 34. Blackwell Publishing Ltd, pp 550–553
Oerley H (2014) How metrology systems improve thin film coating quality with optical in-line process control. In: Proceedings 10th international conference of coatings on glass and plastics, pp 187–189
Paetzold R, Winnacker A, Henseler D, Cesari V, Heuser K (2003) Permeation rate measurements by electrical analysis of calcium corrosion. Rev Sci Instrum 74:5147–5150
Park SHK, Oh J, Hwang CS, Lee JI, Yang YS, Chu HY (2005) Ultrathin film encapsulation of an OLED by ALD Electrochem. Solid State Lett 8:H21–H23
Perovic A (1985) Morphological instability of poly (ethylene terephthalate) cyclic oligomer crystals. J Mater Sci 20:1370–1374
Pervovic A, Sundararajan PR (1982) Crystallization of cyclic oligomers in commercial poly (ethyleneterephathalate) films. Polym Bull 6:277–283
Poodt P, Lankhorst A, Roozeboom F, Spee K, Maas D, Vermeer A (2010a) High-speed spatial atomic-layer deposition of aluminum oxide layers for solar cell passivation. Adv Mater 22: 3564–3567
Poodt P, Lankhorst A, Roozeboom F, Tiba V, Spee K, Maas D, Vermeer A (2010b) 10th international conference on atomic layer deposition, Seoul
Poodt P, Knaapen R, Illiberi A, Roozeboom F, van Asten A (2012a) Low temperature and roll-to-roll spatial atomic layer deposition for flexible electronics. J Vac Sci Technol A 30:01A142
Poodt P, Cameron DC, Dickey E, George SM, Kuznetsov V, Parsons GN, Roozeboom F, Sundaram G, Vermeer A (2012b) Spatial atomic layer deposition: a route towards further industrialization of atomic layer deposition. J Vac Sci Technol A 30:010802
Poodt P, Illiberi A, Roozeboom F (2013a) The kinetics of low-temperature spatial atomic layer deposition of aluminum oxide. Thin Solid Films 532:22–25
Poodt P, van Lieshout J, Illiberi A, Knaapen R, Roozeboom F, van Asten A (2013b) On the kinetics of spatial atomic layer deposition. J Vac Sci Technol A 31:01A108
PURE-ACE®. Teijin Chemicals Ltd, 1-2-2 Uchisaiwai-cho, Chiyoda-ku, Tokyo, Japan
Ramadas S (2008) Nanoparticulate barrier films and gas permeation measurement techniques for thin film solar and display applications. In: Proc AIMCAL Ann Tech Conf
Rooms H, Tripathi J, Coenen M, Groen P (2014) Clean4Yield, Enabling High Yield R2R Production of Printed Electronics. In: Proceedings 10th Int Conf Coatings on glass and plastics, pp 161–163
Shi S, Wang D, Yang J, Zhou W, Li Y, Sun T, Nagayama K (2014) A 9.55-inch flexible top-emission AMOLED with a-IGZO TFTs. Soc Inf Disp Dig 4501:330–333
Shiono S (1979) Separation and identification of Poly(ethylene Terephthalate) Oligomers by Gel Permeation Chromatography. J Polym Sci Polym Chem Ed 17:4123–4127. Wiley
Spee DA (2013) Thin film organic/inorganic multilayer gas barriers by hot wire and initiated CVD. PhD Dissertation, Utrecht University, Utrecht
Spee DA, Rath JK, Schropp REI (2015) Using hot wire and initiated chemical vapor deposition for gas barrier thin film encapsulation. Thin Solid Films 575:67–71
Sproul WE, Graham ME, Wong MS, Rudnik PJ (1997) Reactive dc magnetron sputtering of the oxides of Ti, Zr and Hf. Surf Coat Technol 89:10–15
Stevens M, Tuomela S, Mayer D (2005) Water vapor permeation testing of ultra-barriers: limitations of current methods and advancements resulting in increased sensitivity. In: Proceedings of Society of Vacuum Coaters, 48th annual technical conference, pp 189–191
Suetomi E, Ozaki K, Fukazawa K (2005) Simulation of atmospheric pressure glow discharge in nitrogen. Konica Minolta Technol Rep 2:93–96
Sumilite®. Sumitomo Bakelite Co. Ltd., Ten-Nouzu Parkside Bldg, 5-8,2-Chome, Higashi-Shinagawa, Shinagawa-Ku, Tokyo, 140-0002, Japan
Suntola T, Antson J (1977) Method for producing compound thin films. US Patent 4,058,430 Filing date Nov 25, 1975; Pub date Nov 15, 1977
Teknek Ltd. River Drive, Inchinnan Business Park, Renfrewshire, PA4 9RT, Scotland, UK
Tsujimura T, Fukawa J, Endoh K, Suzuki Y, Hirabayashi K, Mori T (2014) Development of flexible organic light-emitting diode on barrier film and roll-to-roll manufacturing. J Soc Inf Disp 22:412–418
Wickersham CE, Poole JE, Fan JS, Zhu L (2001a) Video analysis of inclusion induced macroparticle emission from aluminum sputtering targets. J Vac Sci Technol A 19:2741–2750
Wickersham CE, Poole JE, Leybovich A, Zhu L (2001b) Measurements of the critical inclusion size for arcing & macroparticle ejection from aluminium sputtering targets. J Vac Sci Technol A 19:2767–2772
Wickersham CE, Poole JE, Fan JS (2002) Arc generation from sputtering plasma-dielectric inclusion interactions. J Vac Sci Technol A 20:833–838
Yaliziz A, Langlois MG (2004) UV versus electron beam radiation curing of vacuum deposited polymer leveling coatings for high barrier applications. In: Proc 47th Ann Tech Conf SVC, pp 600–605
Yun SJ, Ko YW, Lim JW (2004) Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition. Appl Phys Lett 85:4896–4898
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Moro, L. et al. (2018). Barrier Film Development for Flexible OLED. In: Adachi, C., Hattori, R., Kaji, H., Tsujimura, T. (eds) Handbook of Organic Light-Emitting Diodes. Springer, Tokyo. https://doi.org/10.1007/978-4-431-55761-6_25-1
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