Synonyms
Definitions
Scatterometry is a technique for measuring periodic structures on a surface with dimensions from a few nanometers to tens of micrometers. Scatterometry is a fast, nondestructive technique and is, therefore, suitable for in-line metrology.
Theory and Applications
The basic working principle of scatterometry is to use the information in the interference of light interacting with periodic structures, for example, a diffraction grating, to characterize a surface. The intensities of the resulting diffraction orders are used as a unique fingerprint for a given surface. Scatterometry is often applied where imaging techniques cannot be used due to a lack of resolution and can be considered a super-resolution technique.
The Principal Workflow
The principal workflow (Fig. 1) when performing scatterometry measurements uses an inverse modeling approach, with three steps: (1) the experimental measurement in which the light from an optical source is...
This is a preview of subscription content, log in via an institution.
References
Calaon M, Madsen MH, Weirich J, Hansen HN, Tosello G, Hansen PE, Garnaes J, Tang PT (2015) Replication fidelity assessment of large area sub-μm structured polymer surfaces using scatterometry. Surf Topogr Metrol Prop 3:045005
Chernoff DA, Buhr E, Burkhead DL, Diener A (2008) Picometer-scale accuracy in pitch metrology by optical diffraction and atomic force microscopy. Proc SPIE 6922:69223J–692211
Hansen PE, Madsen MH, Lehtolahti J, Nielsen L (2017) Traceable Muller polarimetry and scatterometry for shape reconstruction of grating structures. Appl Surf Sci 421 B:471–479
Hsu SC, Yuan CP, Chena C, Yu CC, Hsing H, Wu R, Kuo KTL, Amir N (2015) Scatterometry or imaging overlay a comparative study. Proc SPIE 9424:942409
Humphries S (1997) Field solutions on computers. CRC Press, New York
Jin J (2002) The finite element method in electromagnetics. IEEE Press, Wiley, New Jersey
Kleinknecht HP, Meier H (1978) Optical monitoring of the etching of SiO2 and Si3N4 on Si by the use of grating test patterns. J Electrochem Soc 125:798–803
Li J, Kritsun O, Dasari P, Volkman C, Wallow T, Hu J (2013) Evaluating scatterometry 3D capabilities for EUV. Proc SPIE 8681:86810S
Madsen MH, Hansen PE (2016) Scatterometry- fast and robust measurements of nano-textured surfaces. Surf Topogr Metrol Prop 4:023003
Madsen MH, Hansen PE, Zalkovskij M, Karamehmedović M, Garnæs J (2015) Fast characterization of moving samples with nano-textured surfaces. Optica 2:301–306
Madsen JS, Thamdrup LH, Czolkos I, Hansen PE, Johansson A, Garnaes J, Nygard J, Madsen MH (2017) In-line characterization of nanostructured mass-produced polymer components using scatterometry. J Micromech Microeng 27:085004
Moharam MG, Gaylord TK (1981) Rigorous coupled-wave analysis of planar-grating diffraction. J Opt Soc Am 71:811–818
Petrik P, Kumar N, Juhasz G, Major C, Fodor B, Agocs E, Lohner T, Pereira SF, Urbach HP, Fried M (2014) Optical characterization of macro-, micro and nanostructures using polarized light. J Phys Conf Ser 558:012008
Storn R, Price K (1997) Differential evolution – a simple and efficient heuristic for global optimization over continuous spaces. J Glob Optim 11:341–359
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Section Editor information
Rights and permissions
Copyright information
© 2018 CIRP
About this entry
Cite this entry
Calaon, M., Madsen, M.H., Leach, R. (2018). Scatterometry. In: The International Academy for Production (eds) CIRP Encyclopedia of Production Engineering. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-35950-7_16855-1
Download citation
DOI: https://doi.org/10.1007/978-3-642-35950-7_16855-1
Received:
Accepted:
Published:
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-35950-7
Online ISBN: 978-3-642-35950-7
eBook Packages: Springer Reference EngineeringReference Module Computer Science and Engineering
