Scatterometry

  • Matteo Calaon
  • Morten Hannibal Madsen
  • Richard Leach
Living reference work entry
DOI: https://doi.org/10.1007/978-3-642-35950-7_16855-1

Synonyms

Definitions

Scatterometry is a technique for measuring periodic structures on a surface with dimensions from a few nanometers to tens of micrometers. Scatterometry is a fast, nondestructive technique and is, therefore, suitable for in-line metrology.

Theory and Applications

The basic working principle of scatterometry is to use the information in the interference of light interacting with periodic structures, for example, a diffraction grating, to characterize a surface. The intensities of the resulting diffraction orders are used as a unique fingerprint for a given surface. Scatterometry is often applied where imaging techniques cannot be used due to a lack of resolution and can be considered a super-resolution technique.

The Principal Workflow

The principal workflow (Fig. 1) when performing scatterometry measurements uses an inverse modeling approach, with three steps: (1) the experimental measurement in which the light from an optical source is...
This is a preview of subscription content, log in to check access.

References

  1. Calaon M, Madsen MH, Weirich J, Hansen HN, Tosello G, Hansen PE, Garnaes J, Tang PT (2015) Replication fidelity assessment of large area sub-μm structured polymer surfaces using scatterometry. Surf Topogr Metrol Prop 3:045005CrossRefGoogle Scholar
  2. Chernoff DA, Buhr E, Burkhead DL, Diener A (2008) Picometer-scale accuracy in pitch metrology by optical diffraction and atomic force microscopy. Proc SPIE 6922:69223J–692211CrossRefGoogle Scholar
  3. Hansen PE, Madsen MH, Lehtolahti J, Nielsen L (2017) Traceable Muller polarimetry and scatterometry for shape reconstruction of grating structures. Appl Surf Sci 421 B:471–479CrossRefGoogle Scholar
  4. Hsu SC, Yuan CP, Chena C, Yu CC, Hsing H, Wu R, Kuo KTL, Amir N (2015) Scatterometry or imaging overlay a comparative study. Proc SPIE 9424:942409CrossRefGoogle Scholar
  5. Humphries S (1997) Field solutions on computers. CRC Press, New YorkGoogle Scholar
  6. Jin J (2002) The finite element method in electromagnetics. IEEE Press, Wiley, New JerseyGoogle Scholar
  7. Kleinknecht HP, Meier H (1978) Optical monitoring of the etching of SiO2 and Si3N4 on Si by the use of grating test patterns. J Electrochem Soc 125:798–803CrossRefGoogle Scholar
  8. Li J, Kritsun O, Dasari P, Volkman C, Wallow T, Hu J (2013) Evaluating scatterometry 3D capabilities for EUV. Proc SPIE 8681:86810SCrossRefGoogle Scholar
  9. Madsen MH, Hansen PE (2016) Scatterometry- fast and robust measurements of nano-textured surfaces. Surf Topogr Metrol Prop 4:023003CrossRefGoogle Scholar
  10. Madsen MH, Hansen PE, Zalkovskij M, Karamehmedović M, Garnæs J (2015) Fast characterization of moving samples with nano-textured surfaces. Optica 2:301–306CrossRefGoogle Scholar
  11. Madsen JS, Thamdrup LH, Czolkos I, Hansen PE, Johansson A, Garnaes J, Nygard J, Madsen MH (2017) In-line characterization of nanostructured mass-produced polymer components using scatterometry. J Micromech Microeng 27:085004CrossRefGoogle Scholar
  12. Moharam MG, Gaylord TK (1981) Rigorous coupled-wave analysis of planar-grating diffraction. J Opt Soc Am 71:811–818CrossRefGoogle Scholar
  13. Petrik P, Kumar N, Juhasz G, Major C, Fodor B, Agocs E, Lohner T, Pereira SF, Urbach HP, Fried M (2014) Optical characterization of macro-, micro and nanostructures using polarized light. J Phys Conf Ser 558:012008CrossRefGoogle Scholar
  14. Storn R, Price K (1997) Differential evolution – a simple and efficient heuristic for global optimization over continuous spaces. J Glob Optim 11:341–359MathSciNetCrossRefzbMATHGoogle Scholar

Copyright information

© CIRP 2018

Authors and Affiliations

  • Matteo Calaon
    • 1
  • Morten Hannibal Madsen
    • 2
  • Richard Leach
    • 3
  1. 1.Department of Mechanical EngineeringTechnical University of DenmarkKongens LyngbyDenmark
  2. 2.Topsil GlobalWafers A/SFrederikssundDenmark
  3. 3.Manufacturing Metrology Team, Faculty of EngineeringUniversity of NottinghamNottinghamUK

Section editors and affiliations

  • Han Haitjema
    • 1
  1. 1.Mitutoyo RCEBestThe Netherlands