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Chemical Vapor Deposition for Film Deposition

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Encyclopedia of Microfluidics and Nanofluidics


Atomistic deposition; CVD; Film coating


Chemical vapor deposition (CVD) is a method of forming dense and stable structural parts or coatings using the decomposition of relatively high vapor pressure gases. Gaseous compounds of the materials to be deposited are transported to a substrate surface where a thermal reaction/deposition occurs. Reaction by-products are then exhausted out of the system.


Chemical vapor deposition or CVD is a generic name for a group of processes that involve depositing a solid material from a gaseous phase and is similar in some respects to physical vapor deposition (PVD). PVD is different in that the precursors are solid, with the material to be deposited being vaporized from a solid target and deposited onto the substrate.

CVD is relatively a mature and well-defined process, and its application in industries has gained widespread usage over the last 40 years. CVD process has evolved from simple extraction into more complex...

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Correspondence to Dharmalingam Sugumar .

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© 2014 Springer Science+Business Media New York

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Sugumar, D., Kong, L. (2014). Chemical Vapor Deposition for Film Deposition. In: Li, D. (eds) Encyclopedia of Microfluidics and Nanofluidics. Springer, Boston, MA.

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