CIRP Encyclopedia of Production Engineering

2014 Edition
| Editors: The International Academy for Production Engineering, Luc Laperrière, Gunther Reinhart

Physical Vapor Deposition (PVD)

  • Konstantinos-Dionysios Bouzakis
  • Nikolaos Michailidis
Reference work entry
DOI: https://doi.org/10.1007/978-3-642-20617-7_6489

Synonyms

Definition

Physical vapor deposition (PVD) is a vacuum process allowing material transfer in the form of vapor particles from a material source (target) to the substrate.

Theory and Application

History

The development of PVD techniques is directly linked to the evolution of vacuum, electronics, magnetism, and plasma technologies, as well as to the advances of gaseous chemistry. A combination of numerous related achievements and inventions was the prerequisite for the first industrial application of PVD. In the 1930s, cathode sputtering was employed for the fabrication of coatings (Furth 1932), while sputtering by ion bombardment was reported for commercial application in the 1950s (Wehner 1955). Evaporation techniques like arcing were developing in parallel. Today, complicated techniques offer the potential to produce nano-structured, single- and multilayered coatings, with improved properties. Recent trends aim, among others, at reducing...

This is a preview of subscription content, log in to check access.

References

  1. Bobzin K, Bagcivan N, Immich P, Bolz S, Alami J, Cremer R (2009) Advantages of nanocomposite coatings deposited by high power pulse magnetron sputtering technology. J Mater Process Technol 209(1):165–170CrossRefGoogle Scholar
  2. Bobzin K, Bagcivan N, Reinholdt A, Ewering M (2010) Thermal stability of γ-Al2O3 coatings for challenging cutting operations. Surf Coat Technol 205(5):1444–1448CrossRefGoogle Scholar
  3. Bouzakis K-D, Vidakis N, Erkens G (2002) Sensors for process monitoring: coating processes. In: Tönshoff H, Inasaki I (eds) Sensors in manufacturing, vol. 1. Wiley-VCH Verlag GmbH, Weinheim, FRGGoogle Scholar
  4. Bouzakis K-D, Makrimallakis S, Katirtzoglou G, Skordaris G, Gerardis S, Bouzakis E, Leyendecker T, Bolz S, Koelker W (2010) Adaption of graded Cr/CrN-interlayer thickness to cemented carbide substrates' roughness for improving the adhesion of HPPMS PVD films and the cutting performance. Surf Coat Technol 205(5):1564–1570CrossRefGoogle Scholar
  5. Bouzakis K-D, Michailidis N, Skordaris G, Bouzakis E, Biermann D, M'Saoubi R (2012) Cutting with coated tools: coating technologies, characterization methods and performance optimization. CIRP Ann Manuf Technol 61(2):703–723CrossRefGoogle Scholar
  6. Ehiasarian AP (2010) High-power impulse magnetron sputtering and its applications. Pure Appl Chem 82(6):1247–1258CrossRefGoogle Scholar
  7. Erkens G (2008) Hochleistungsbeschichtungen für Präzisionswerkzeuge der Zerspanung, der Ur- und Umformung, der Formgebung und der Kunststoffverarbeitung [High-performance-layer for precision tools in machining, casting, forming and plastics processing]. In: 2008 Jahrbuch Oberflächen, Band 64, Eugen G. Leuze Verlag, pp 116–118Google Scholar
  8. Erkens G, Cremer R, Hamoudi T, Bouzakis K, Mirisidis J, Hadjiyiannis S, Skordaris G, Asimakopoulos A, Kombogiannis S, Anastopoulos J (2003) Supernitrides: a novel generation of PVD hardcoatings to meet the requirements of high demanding cutting applications. CIRP Ann Manuf Technol 52(1):65–68CrossRefGoogle Scholar
  9. Erkens G, Vetter J, Mueller J, Brinke T, Fromme M, Mohnfeld A (2011) Plasma-assisted surface coating: processes, methods, systems and applications. Süddeutscher Verlag onpact GmbH, MünchenGoogle Scholar
  10. Furth HF (1932) Cathode sputtering: a commercial application. Physics 2:280CrossRefGoogle Scholar
  11. Hovsepian PE, Ehiasarian AP, Ratayski U (2009) CrAlYCN/CrCN nanoscale multilayer PVD coatings deposited by the combined high power impulse magnetron sputtering/unbalanced magnetron sputtering (HIPIMS/UBM) technology. Surf Coat Technol 203:1237–1243CrossRefGoogle Scholar
  12. Sarakinos K, Alami J, Konstantinidis S (2010) High power pulsed magnetron sputtering: A review on scientific and engineering state of the art. Surf Coat Technol 204(11):1661–1684CrossRefGoogle Scholar
  13. Schuetze A, Quinto DT (2003) Pulsed plasma-assisted PVD sputter-deposited alumina thin films. Surf Coat Technol 162(2–3):174–182CrossRefGoogle Scholar
  14. Wehner GK (1955) Cathode sputtering: a commercial application. In: Marton L (ed) Advances in electronics and electron physics, vol. 7. Academic, New York, pp 239–298Google Scholar

Copyright information

© CIRP 2014

Authors and Affiliations

  • Konstantinos-Dionysios Bouzakis
    • 1
  • Nikolaos Michailidis
    • 2
  1. 1.Laboratory for Machine Tools and Manufacturing Engineering and Fraunhofer Project Center Coatings in Manufacturing (PCCM)/Mechanical Engineering DepartmentAristoteles University of ThessalonikiThessalonikiGreece
  2. 2.Physical Metallurgy Laboratory and Fraunhofer Project Center Coatings in Manufacturing (PCCM)/Mechanical Engineering DepartmentAristoteles University of ThessalonikiThessalonikiGreece