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Stamping Techniques for Micro- and Nanofabrication

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Springer Handbook of Nanotechnology

Part of the book series: Springer Handbooks ((SHB))

Abstract

Soft-lithographic techniques that use rubber stamps and molds provide simple means to generate patterns with lateral dimensions that can be much smaller than one micron and can even extend into the single nanometer regime. These methods rely on the use of soft elastomeric elements typically made out of the polymer poly(dimethylsiloxane). The first section of this chapter presents the fabrication techniques for these elements together with data and experiments that provide insights into the fundamental resolution limits. Next, several representative soft-lithography techniques based on the use of these elements are presented: (i) microcontact printing, which uses molecular ‘inks’ that form self-assembled monolayers, (ii) near- and proximity-field photolithography for producing two- and three-dimensional structures with subwavelength resolution features, and (iii) nano-transfer printing, where soft or hard stamps print single or multiple layers of solid inks with feature sizes down to 100 nm. The chapter concludes with descriptions of some device-level applications that highlight the patterning capabilities and potential commercial uses of these techniques.

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Abbreviations

µCP:

microcontact printing

CMOS:

complementary metal oxide semiconductor

DBR:

distributed Bragg reflector

DFB:

distributed feedback

HDT:

hexadecanethiol

ITO:

indium tin oxide

MIM:

metal-insulator-metal

MPTMS:

3-mercaptopropyltrimethoxysilane

PDMS:

polydimethylsiloxane

PECVD:

plasma enhanced chemical vapor deposition

PET:

poly(ethylene terephthalate)

SAM:

scanning acoustic microscopy

SAM:

self-assembled monolayer

SEM:

scanning electron microscopy

SWNT:

single-wall nanotube

nTP:

nanotransfer printing

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Author information

Authors and Affiliations

  1. Department of Materials Science and Engineering, 3714 Beckman Institute, 1304 W. Green St., 61801, Urbana, IL, USA

    Etienne Menard Ph.D.

  2. Department of Materials Science and Engineering, University of Illinois, 1304 W. Green St., 61801, Urbana, IL, USA

    John Rogers pROF.

Authors
  1. Etienne Menard Ph.D.
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  2. John Rogers pROF.
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Correspondence to Etienne Menard Ph.D. or John Rogers pROF. .

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Editors and Affiliations

  1. Nanotribology Laboratory for Information Storage and MEMS/NEMS (NLIM), Ohio State University, 201 W. 19th Avenue, W 390 Scott Laboratory, Ohio 43210-1142, Columbus, OH, USA

    Bharat Bhushan Prof.

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Menard, E., Rogers, J. (2007). Stamping Techniques for Micro- and Nanofabrication. In: Bhushan, B. (eds) Springer Handbook of Nanotechnology. Springer Handbooks. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-29857-1_9

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