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Basic and General Optics for Laser Processing

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Handbook of Laser Micro- and Nano-Engineering

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Abstract

This chapter describes the basic setup of optical systems for laser microprocessing, including basic optics and components for beam guiding, and for pulse energy and pulse repetition rate control. In the introduction, a brief history on the evolution of optical devices for laser processing is presented. The basic setup of optical systems for laser processing is categorized in four types based on their usage: (1) system with stationary single focused beam; (2) system with beam scanners; (3) projection system with masks or spatial light modulators (SLMs); and (4) system using interference patterning.

On the basic optics and components for beam guiding devices, this chapter explains laser-induced damage and polarizers. References are given for Gaussian optics, lenses, mirrors, and associated elements. On the basic optics and components for pulse energy and pulse repetition rate control, polarizer-based tunable attenuators, acousto-optic modulators (AOMs), and electro-optic modulators (EOMs) are explained.

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Authors and Affiliations

  1. Paradigm Laser Research Ltd., Machida, Tokyo, Japan

    Kunihiko Washio

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  1. Kunihiko Washio
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Correspondence to Kunihiko Washio .

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Editors and Affiliations

  1. RIKEN Center for Advanced Photonics, Wako, Saitama, Japan

    Koji Sugioka

Section Editor information

  1. State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China

    Ya Cheng

  2. Paradigm Laser Research Ltd., Machida, Tokyo, Japan

    Kunihiko Washio

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Washio, K. (2021). Basic and General Optics for Laser Processing. In: Sugioka, K. (eds) Handbook of Laser Micro- and Nano-Engineering. Springer, Cham. https://doi.org/10.1007/978-3-030-63647-0_1

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