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Metalorganic Chemical Vapor Deposition (MOCVD)

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Thin-film deposition technique that uses metalorganic vapor-phase precursors to form a solid thin film on substrate surfaces. The metalorganic precursor provides a volatile source of inorganic elements to a growth surface which are then thermally disassociated from their organic components on the substrate surface.

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Fabrication of Self-Assembled Catalytic Nanostructures

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  • DOI: 10.1007/978-0-387-48998-8_889
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© 2008 Springer-Verlag

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(2008). Metalorganic Chemical Vapor Deposition (MOCVD). In: Li, D. (eds) Encyclopedia of Microfluidics and Nanofluidics. Springer, Boston, MA. https://doi.org/10.1007/978-0-387-48998-8_889

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