Chemical Vapor Deposition (CVD)
Chemical vapor deposition (CVD) is a process whereby a solid material is deposited from the reaction of vapor-phase chemical reactants on or close to a substrate surface. The solid material is obtained as a coating, a powder, or single crystals. A reaction chamber is used for the process, into which the reactant gases are introduced to decompose and react. By varying the environmental conditions such as substrate material and temperature, composition of the reaction gas mixture, total pressure gas flows, etc., materials with different properties can be grown (Martin 2010).
Theory and Application
Chemical vapor deposition (CVD) is a widely used materials-processing technology. It is a synthesis process capable of producing high-purity, high-performance solid materials through chemical reactions in vapor phase. CVD is commonly used to deposit conformal films to surfaces essential in the manufacture of semiconductors and other electronic components; in the...
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