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Extraordinary Young’s Interferences and Super-Diffraction Laser Lithography

  • Xiangang LuoEmail author
Living reference work entry
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Abstract

As a low-cost, high-efficient, and large-area nanofabrication approach, optical lithography has attracted a great deal of interests and shows promising applications in integrated circuit manufacturing. However, the diffraction limit of light leads to the resolution improvement of optical lithography relying on the shrinking wavelength of exposure source, which is hard to be maintained. Inspired by the extraordinary Young’s interference, the short wavelength property of M-wave, a special surface wave confined at the surface of structured materials, is discovered, which offers a potential way to surpass the traditional diffraction limit. During the past years, researchers have proposed a variety of plasmonic lithography methods in the manner of interference and imaging and have demonstrated that sub-diffraction resolution could be achieved by theoretical simulations or experiments. This chapter will give a review and some discussion about the advances in this realm.

Keywords

Extraordinary Young’s interferences Surface plasmons Plasmonic lithography Sub-diffraction lithography 

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Copyright information

© Springer Nature Switzerland AG 2020

Authors and Affiliations

  1. 1.State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-EngineeringInstitute of Optics and Electronics, Chinese Academy of SciencesChengduChina

Section editors and affiliations

  • Minghui Hong
    • 1
  1. 1.Dept. of Electrical & Computer EngineeringNational University of SingaporeSingaporeSingapore

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