Porous Silicon Formation by Stain Etching

  • Kurt W. KolasinskiEmail author
Reference work entry


Spontaneous electroless etching of silicon surfaces with hydrofluoric acid and chemical oxidant-based solutions is often referred to as “stain etching” due to the color change it imparts. The field is comprehensively reviewed with regard to the etching mechanisms and the range of chemical oxidants explored to date.


Porous Silicon Etch Rate Hole Injection High Etch Rate Porous Silicon Film 
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Authors and Affiliations

  1. 1.Department of ChemistryWest Chester UniversityWest ChesterUSA

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