Living Reference Work Entry

Handbook of Porous Silicon

pp 1-9

Date: Latest Version

Drying Techniques Applied to Porous Silicon

  • Leigh CanhamAffiliated withSchool of Physics and Astronomy, University of Birmingham Email author 

Abstract

Wet-etched mesoporous silicon is normally dried in the air, but this limits the range of porosities and surface areas achievable, due to capillary force-induced collapse of the silicon skeleton. This updated review discusses the various alternative drying techniques with particular attention paid to supercritical/critical point drying, a powerful technique applicable to all physical forms of porous silicon. Optimized etching and supercritical drying conditions have recently led to the achievement of silicon powder surface areas up to 1125m2/g from anodized p− wafers and pore volumes up to 4.66 ml/g from anodized p + wafers. Supercritical drying has also been used to minimize “bundling” of porous silicon nanowires in closely spaced arrays.

Keywords

Porous silicon drying supercritical drying