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Layout Decomposition for Triple Patterning

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Recommended Reading

  1. Fang SY, Chen WY, Chang YW (2012) A novel layout decomposition algorithm for triple patterning lithography. In: IEEE/ACM design automation conference (DAC), San Francisco, pp 1185–1190

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  2. Kuang J, Young EF (2013) An efficient layout decomposition approach for triple patterning lithography. In: IEEE/ACM design automation conference (DAC), Austin, pp 69:1–69:6

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  3. Tian H, Zhang H, Ma Q, Xiao Z, Wong M (2012) A polynomial time triple patterning algorithm for cell based row-structure layout. In: IEEE/ACM international conference on computer-aided design (ICCAD), San Jose, pp 57–64

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  4. Yu B, Pan DZ (2014) Layout decomposition for quadruple patterning lithography and beyond. In: IEEE/ACM design automation conference (DAC), San Francisco

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  5. Yu B, Yuan K, Zhang B, Ding D, Pan DZ (2011) Layout decomposition for triple patterning lithography. In: IEEE/ACM international conference on computer-aided design (ICCAD), San Jose, pp 1–8

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  6. Yu B, Lin YH, Luk-Pat G, Ding D, Lucas K, Pan DZ (2013) A high-performance triple patterning layout decomposer with balanced density. In: IEEE/ACM International conference on computer-aided design (ICCAD), San Jose, pp 163–169

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  7. Yu B, Xu X, Gao JR, Pan DZ (2013) Methodology for standard cell compliance and detailed placement for triple patterning lithography. In: IEEE/ACM international conference on computer-aided design (ICCAD), San Jose, pp 349–356

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  8. Zhang Y, Luk WS, Zhou H, Yan C, Zeng X (2013) Layout decomposition with pairwise coloring for multiple patterning lithography. In: IEEE/ACM international conference on computer-aided design (ICCAD), San Jose, pp 170–177

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Correspondence to David Z. Pan .

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© 2016 Springer Science+Business Media New York

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Yu, B., Pan, D.Z. (2016). Layout Decomposition for Triple Patterning. In: Kao, MY. (eds) Encyclopedia of Algorithms. Springer, New York, NY. https://doi.org/10.1007/978-1-4939-2864-4_744

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