Ion Beam Instruments Used for Nanomanufacturing

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Abstract

The understanding of the physics and mechanism and the ability of imaging, manipulation as well as fabrication of devices and systems at nanometer scale is undoubtedly the frontier of today’s science and technology. The momentum of current research and industrial progress calls for continuous development of new state-of-the-art tools. The interdisciplinary fields of material science, physics, biology, mechanics, and electronics clearly perpetually seek superpower facilities that persist integrated functions to conduct operation as well as to see the nano-world. The ion beam (IB) technology is one of them that can meet the demands of today’s science and technology. In this chapter, we present a basic introduction of the ion beam instruments, which are classified into two catalogs that based on focused ion beams and broad beams. In particular, the ion sources, ion optics, and some most advanced focused ion beam facilities are discussed followed by the brief introduction of broad beam instruments for nanofabrication, including the ion beam etching, deposition, and implantation systems.

Keywords

Focused ion beam instruments Broad beam instruments Liquid metal ion source Gas field ion source Ion optics Single ion beam system CrossBeam system Triple beam system Helium ion microscope Ion beam nanolithography instruments Ion beam etching system Ion beam deposition system Ion beam implantation system 
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Copyright information

© Springer-Verlag London 2013

Authors and Affiliations

  1. 1.Beijing National Laboratory for Condensed Matter PhysicsThe Institute of Physics, Chinese Academy of SciencesBeijingChina

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