Abstract
Continuing engineering progress in precision fabrication technologies, especially in the semiconductor industry, precision optics fabrication, and the diversified micro- and nanotechnologies, stimulates the advance in precision metrology. Fabricated structures reach atomic dimensions in ever-larger areas, thus becoming more and more complex, also in three dimensions. Consequently, measurements are made – to an increasing extent – of larger surface regions and sidewalls with higher aspect ratios as well as fully 3D micro- and nanostructures. Advanced high precision measurement technology is more and more an enabling technology for nanotechnologies. Today, nanopositioning and nanomeasuring machines provide high-precision measurements and the positioning of objects across different scales, from subnanometers up to several centimeters. This chapter deals with the requirements for highest measurement performance at the limits of physics and technology, resulting from the progress and the goals of modern high-tech fabrication technologies. The fundamentals of the nanopositioning and nanomeasuring machine, developed at the Institute of Process Measurement and Sensor Technology of the Ilmenau University of Technology and manufactured by the SIOS Meßtechnik GmbH Ilmenau, are described, and the measurement capabilities, potential applications, progress in research, and prospects of the device for the near future are pointed out.
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Notes
- 1.
Courtesy of X-Fab Semiconductor Foundries AG
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Manske, E. (2019). Nanopositioning and Nanomeasuring Machines. In: Gao, W. (eds) Metrology. Precision Manufacturing. Springer, Singapore. https://doi.org/10.1007/978-981-10-4912-5_2-1
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DOI: https://doi.org/10.1007/978-981-10-4912-5_2-1
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