1. Manufacturing technologies for miniaturized interference filters

   • M. Frank
   • N. Kaiser

   Pages: 77 - 81

2. Proton micromachining: a new technique for the production of three-dimensional microstructures

   • J.A. van Kan
   • J. L. Sanchez
   • F. Watt

   Article Pages: 82 - 85

3. Improvement of sidewall roughness in deep silicon etching

   • M. Chabloz
   • Y. Sakai
   • K. Tsutsumi

   Article Pages: 86 - 89

4. Development of new position sensitive electron multiplication device fabricated by LIGA process

   • M. Inoue
   • D. Fukuda
   • T. Haga

   Article Pages: 90 - 93

5. Fabrication of HARM structures by deep-X-ray lithography using graphite mask technology

   • P. Coane
   • R. Giasolli
   • J. Göttert

   Article Pages: 94 - 98

6. The influence of mask substrate thickness on exposure and development times for the LIGA process

   • S. K. Griffiths
   • A. Ting
   • J. M. Hruby

   Article Pages: 99 - 102

7. Direct, high throughput LIGA for commercial applications: a progress report

   • H. Guckel
   • K. Fischer
   • C. Kirk

   Article Pages: 103 - 105

8. High aspect ratio silicon trench fabrication by inductively coupled plasma

   • C. K. Chung
   • H. C. Lu
   • T. H. Jaw

   Article Pages: 106 - 108

9. TRANSTEC – A new tool for online educational multimedia training on innovative high aspect ratio microtechnologies

   • A. Schmidt
   • R. Brück
   • T. Stange

   Article Pages: 109 - 112

10. ANKA – a synchrotron light source for X-ray based micromachining

    • J. Göttert
    • H. O. Moser
    • R. Steininger

    Article Pages: 113 - 116

11. Large area, cost effective X-ray masks for high energy photons

    • K. Fischer
    • B. Chaudhuri
    • H. Guckel

    Article Pages: 117 - 120