Volume 76, Issue 1

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December 1986

Symposium C — Science and Technology of Microfabrication

Issue Editors:

R.E. Howard,
E.L. Hu,
S. Namga,
S. Pang

52 articles in this issue

Inside Submicron MOSFETS
W. J. Skocpol
OriginalPaper 25 February 2011 Pages: 3 - 11
Localization and Electron-Electron Interaction Effects in Platinum Silicide Thin Wires
S. Ishida
K. Murase
S. Uematsu
OriginalPaper 25 February 2011 Pages: 13 - 17
Quantum Interference Effect in Narrow n⁺-GaAs Wires
Koji Ishibashi
Koh Nagata
Susumu Namba
OriginalPaper 25 February 2011 Pages: 19 - 24
A Silicon Field Emitter Array Planar Vacuum FET Fabricated with Microfabrication Techniques
Henry F. Gray
G. J. Campisi
OriginalPaper 25 February 2011 Pages: 25 - 30
Confinement and Fluorescence of Aromatic Molecules in Microporous Amorphous Superlattices
C. B. Roxlo
P. Mitra
P. P. Wong
OriginalPaper 25 February 2011 Pages: 31 - 35
Microfabrication Technologies for Advanced VLSI Devices
Y. Horiike
R. Yoshikawa
T. Takigawa
OriginalPaper 25 February 2011 Pages: 39 - 48
Microporous Amorphous Superlattices
H. W. Deckman
B. Abeles
T. Tiedje
OriginalPaper 25 February 2011 Pages: 49 - 54
30-nm-Scale Device Fabrication for Electron Transport Studies
M. J. Rooks
P. Mceuen
D. E. Prober
OriginalPaper 25 February 2011 Pages: 55 - 59
Nanometer Lithography for Quantum Scale Devices
Charles F. Cook Jr.
Joseph H. Kwiatkowski
Harry L. Berkowitz
OriginalPaper 25 February 2011 Pages: 61 - 65
Microfabrication of Field Emission Devices for Vacuum Integrated Circuits using Orientation Dependent Etching
G. J. Campisi
H. F. Gray
OriginalPaper 25 February 2011 Pages: 67 - 72
The Stability of Ion Projection Lithography Masks
J. N. Randall
D. Bellavance
R. Sivasankar
OriginalPaper 25 February 2011 Pages: 73 - 77
Maskless Patterning of Mo and Si by Focused Ion Beam Implantation
Kenji Gamo
Katsuyuki Yonehara
Susumu Namba
OriginalPaper 25 February 2011 Pages: 79 - 83
Fabrication of Encapsulated Indium Films for Melting Experiments
John H. Scofield
R. W. Epworth
D. M. Tennant
OriginalPaper 25 February 2011 Pages: 85 - 89
Submicron Pattern Delineation Using a Pulsed Electron-Beam in Soft Vacuum
Jayaraxn Krishnaswamy
Lumin Li
H. Hiraoka
OriginalPaper 25 February 2011 Pages: 91 - 96
Silicon as a Mechanical Material
Kurt Petersen
OriginalPaper 25 February 2011 Pages: 99 - 110
Micromachining of Silicon Mechanical Structures
G. Kaminsky
OriginalPaper 25 February 2011 Pages: 111 - 121
Mechanical Property Determination for Supported Polymer Films using Double Bending Beams
B. J. Han
H. M. Tong
Carl C. Gryte
OriginalPaper 25 February 2011 Pages: 123 - 127
Material Considerations in the Microfabrication of Grating Microstructures for use in a Laser-Powered Linear Accelerator
John B. Warren
OriginalPaper 25 February 2011 Pages: 129 - 133
Ion Beam Machining of Micromechanical Structures
S. T. Davies
D. K. Bowen
OriginalPaper 25 February 2011 Pages: 135 - 139
Hot Jet Etching through Stencil Masks
M. W. Geis
S. W. Pang
N. N. Efremow
OriginalPaper 25 February 2011 Pages: 143 - 145
193-NM Excimer Laser-Assisted Etching of Polysilicon
K. D. Armacost
S. V. Babu
J. F. Rembetski
OriginalPaper 25 February 2011 Pages: 147 - 156
Anisotropic and Selective Reactive Ion Etching of SiC in CHF₃ and Oxygen Plasma
W.-S. Pan
A. J. Steckl
OriginalPaper 25 February 2011 Pages: 157 - 162
Dry Etching Damage in GaAs and Al_0.22Ga_0.78As
D. Kirillov
C. B. Cooper III
R. A. Powell
OriginalPaper 25 February 2011 Pages: 163 - 169
The Characterization of Silicon Damaged by Low Energy Argon Ion Etching
C. H. Seager
J. K. G. Panitz
D. K. Brice
OriginalPaper 25 February 2011 Pages: 171 - 178
The Role of F Atoms in the Reactive Sputter Etching of Silicon Dioxide: Langmuir Probe and Optical Actinometry Measurements
C. H. Steinbrüchel
B. J. Curtis
OriginalPaper 25 February 2011 Pages: 179 - 183
Surface Characteristics of Monocrystalline ß-SiC dry etched in fluorinated gases
John W. Palmour
R. F. Davis
P. Blackborow
OriginalPaper 25 February 2011 Pages: 185 - 190
Reactive Ion Etching of AI(Cu) Alloys
C.-K. Hu
M. B. Small
M. Schadt
OriginalPaper 25 February 2011 Pages: 191 - 195
Determination of the Threshold Energy of Noble Gas Defects in Silicon Created by Ion Beam Etching
W. D. Sawyer
J. Weber
OriginalPaper 25 February 2011 Pages: 197 - 201
Evidence for Polycrystalline Si Surface Layer Formation by Argon Implantation and its Passivation by Atomic Hydrogen
H.-C. Chien
S. Ashok
J. H. Slowik
OriginalPaper 25 February 2011 Pages: 203 - 207
A Theoretical Study of the Etchback Planarization Process
Yue Kuo
OriginalPaper 25 February 2011 Pages: 209 - 214
Reactive Ion Etching of Multi-Layer Resist
H. Y. Ng
D. P. Klaus
W. W. Molzen
OriginalPaper 25 February 2011 Pages: 215 - 219
Laser Microfabrication Technology and its Application to High Speed Interconnect of Gate Arrays
Anthony F. Bernhardt
Bruce M. McWilliams
John C. Whitehead
OriginalPaper 25 February 2011 Pages: 223 - 234
Nitride, Nitrided Oxide and Oxidized Nitride for Thin Dielectrics
S. P. Tay
A. Kalnitsky
J. P. Ellul
OriginalPaper 25 February 2011 Pages: 235 - 239
Process-Induced Point Defects in Oxidized Silicon Structures
P. J. Caplan
E. H. Poindexter
R. C. Henderson
OriginalPaper 25 February 2011 Pages: 241 - 245
The Composition and Interfacial Properties of Cvd Tungsten Films
C. Yang
S. Mehta
P. Davies
OriginalPaper 25 February 2011 Pages: 247 - 252
Characterization of W/WSI_x/Si Contact Structures under Thermal Annealing for Some X Values
S. Ogawa
K. Yamazaki
Y. Terui
OriginalPaper 25 February 2011 Pages: 253 - 257
Post Oxidation Anneal and Re-Oxidation Effects in 5 nm SiO₂ Films
L. Dori
M. Arienzo
J. Wetzel
OriginalPaper 25 February 2011 Pages: 259 - 263
Characterization of Bias Sputtered Aluminum Film
Y. Homma
K. Hinode
T. Terada
OriginalPaper 25 February 2011 Pages: 265 - 269
A Process for 0.5 Micron CMOS Gate Definition
D. Stanasolovich
S. Katz
L. K. Wang
OriginalPaper 25 February 2011 Pages: 271 - 275
The Effect of Window Edge Stress on Dopant Diffusion in Silicon
C. K. Huang
T. Kook
R. J. Jaccodine
OriginalPaper 25 February 2011 Pages: 277 - 281
Boron Diffusion in Polycrystalline Silicon
Moustafa Y. Ghannam
Robert W. Dutton
Steven W. Novak
OriginalPaper 25 February 2011 Pages: 283 - 288
Gettering Processes for Sub-Micron VLSI
John Andrews
OriginalPaper 25 February 2011 Pages: 289 - 293
Materials Surface Processing with Excimer Lasers
David J. Elliott
Bernhard P. Piwczyk
OriginalPaper 25 February 2011 Pages: 295 - 299
Electron Bean Induced Defects in Silicon/Indium Oxide Heterojunctions and Interfacial Reactions During Annealing
S. Kar
A. Pandey
R. K. Dwivedi
OriginalPaper 25 February 2011 Pages: 301 - 306
Electrical Characterization of Some Native Insulators on Germanium
O. J. Gregory
E. E. Crisman
James J. Rosenberg
OriginalPaper 25 February 2011 Pages: 307 - 311
High Field Microscopy Studies of Gallium Arsenide-Metal Interface
Chand Patel
OriginalPaper 25 February 2011 Pages: 313 - 321
The Effect of Implant and Rapid Thermal Annealing Temperatures on Ion Beam Mixing of Titanium Silicide
G. A. Mattiussi
J. L. Whitton
V. Q. Ho
OriginalPaper 25 February 2011 Pages: 323 - 329
Simulation of Microposit 2400-17 Resist Profiles for 0.5μm Photolithography at 248 nm
R. K. Watts
T. M. Wolf
M. Y. Hellman
OriginalPaper 25 February 2011 Pages: 333 - 340
Thermal Reactions of Bisazides in Resists Containing Double Bonds
C. A. Pryde
OriginalPaper 25 February 2011 Pages: 341 - 345
Reactive Ion Etching and Lithographic Characterization of a New Organosilicon Resist
R. G. Tarascon
A. Shugard
E. Reichmanis
OriginalPaper 25 February 2011 Pages: 347 - 351

Volume 76, Issue 1

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