Volume 616, Issue 1

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December 2000

Symposium I — New Methods, Mechanisms & Models of Vapor Deposition

Issue Editors:

W. Barker,
G. Gilmer,
H. N. G. Wadley

39 articles in this issue

Surface Catalyzed Photo-Assisted Mocvd of Cobalt Thin Films for Enhanced Control of Magnetic Properties
M. F. Chioncel
P. W. Haycock
J. W. Bull
OriginalPaper 10 February 2011 Pages: 3 - 8
A Parallel Detecting, Spectroscopic Ellipsometer for Intelligent Process Control of Continuously Deposited CIGS Films
L. J. Simpson
B. S. Joshi
T. E. Furtak
OriginalPaper 10 February 2011 Pages: 9 - 14
Real Time Substrate Temperature Control by Emissivity Compensated Pyrometry During In_xGa_1−xAs_1−y/InP Growth on Production Scale Rotating Disc MOVPE Reactors
J. Ramer
B. Patel
A. Gurary
OriginalPaper 10 February 2011 Pages: 15 - 20
Chemical Vapor Deposition Coating for Micromachines
S. S. Mani
J. G. Fleming
M. T. Dugger
OriginalPaper 10 February 2011 Pages: 21 - 26
On the Challenges and Opportunities of Sensing Materials Growth Within Production Deposition Tools
John C. Bean
S. Kanakaraju
Mark Lau
OriginalPaper 10 February 2011 Pages: 27 - 39
Vapor Phase Synthesis of II-IV Semiconductor Nanoparticles in a Counterflow Jet Reactor
D. Sarigiannis
J. D. Peck
A. Petrou
OriginalPaper 10 February 2011 Pages: 41 - 46
Thermodynamics of Paracrystalline Silicon
P. M. Voyles
M. M. J. Treacy
J. M. Gibson
OriginalPaper 10 February 2011 Pages: 47 - 52
Low Pressure Photo-Assisted Mocvd for the Production of Homogeneous, Low-Strain, Amorphous Titanium Oxide Films
P. W. Haycock
M. G. Lopez
E. W. Williams
OriginalPaper 10 February 2011 Pages: 53 - 58
Diamond Synthesis with Completely Closed Eacvd Method
Takashi Kato
Masahiro Nishida
Yoshiki Takagi
OriginalPaper 10 February 2011 Pages: 59 - 60
Kinetic Monte Carlo Simulation of Dynamic Phenomena in thin Film Growth
M. A. Gallivan
R. M. Murray
D. G. Goodwin
OriginalPaper 10 February 2011 Pages: 61 - 66
A Drastic Change in Structure and Property of TiO₂ Thin Films Deposited by Metal-Organic Chemical Vapor Deposition With Deposition Temperature
Jeong-Hoon Park
Woon-Jo Cho
Kug-Sun Hong
OriginalPaper 10 February 2011 Pages: 67 - 74
Surface and Microstructural Characterization of Homoepitaxial Silicon Grown by Pulsed Laser Deposition
J. S. Pelt
R. Magahña Jr
M. Kobayashi
OriginalPaper 10 February 2011 Pages: 75 - 80
Morphological, Chemical and Structural Study of Sputtered Al/Al₂O₃ Multilayers
C. Le Paven-Thivet
P. Aubert
Ph Houdy
OriginalPaper 10 February 2011 Pages: 81 - 86
Composition and Structure of Sputter Deposited Erbium Hydride thin Films
D. P. Adams
J. A. Romero
J. C. Banks
OriginalPaper 10 February 2011 Pages: 87 - 92
Atomic Layer Deposition of thin Films Using Sequential Surface Reactions
S. M. George
J. D. Ferguson
J. W. Klaus
OriginalPaper 10 February 2011 Pages: 93 - 101
Energetic Inert Gas Atom Impact Effects During Ion Beam Multilayer Deposition
X. W. Zhou
W. Zou
H. N. G. Wadley
OriginalPaper 10 February 2011 Pages: 103 - 108
Real Time, In Situ Curvature Measurements of Epitaxial YBCO Films on MgO
D. Boyd
A. Tripathi
D. Goodwin
OriginalPaper 10 February 2011 Pages: 109 - 114
Kinetic Roughening During Rare-Gas Homoepitaxy
E. Nabighian
M. C. Bartelt
X. D. Zhu
OriginalPaper 10 February 2011 Pages: 115 - 121
Diamond CVD Growth Mechanisms and Reaction Rates From First-Principles
I.I Oleinik
D. G. Pettifor
M. P. D’evelyn
OriginalPaper 10 February 2011 Pages: 123 - 128
The Influence of Clusters on Vapor-Deposited thin Films: Atomistic Simulations
J. Dalla
G. H. Gilmer
M. Djafari Rouhani
OriginalPaper 10 February 2011 Pages: 129 - 134
Sputter Deposition of GMR Spin Valves
W. Zou
X. W. Zhou
Jon Ebert
OriginalPaper 10 February 2011 Pages: 135 - 140
Simulation of 3D Films Deposited by Glancing Angle Deposition Using3D-Films
T. Smy
D. Vick
K. D. Harris
OriginalPaper 10 February 2011 Pages: 141 - 146
Modeling of Ionized Magnetron Sputtering of Copper
M. O. Bloomfield
T. S. Cale
OriginalPaper 10 February 2011 Pages: 147 - 152
Comprehensive Reactor-Scale Modeling of III-V Ternary Compound Growth by Movpe
E. V. Yakovlev
R. A. Talalaev
S. A. Lowry
OriginalPaper 10 February 2011 Pages: 153 - 158
Optimal Design of Reactors for Metalorganic Vapor Phase Epitaxy of Group III Nitrides
R. P. Pawlowski
C. Theodoropoulos
E. J. Thrush
OriginalPaper 10 February 2011 Pages: 159 - 164
Computational Experiment on CVD of SiC: Growth Rate, C/Si Ratio, Parasitic Phase Formation
Andrei N. Vorob’ev
Alexandre E. Komissarov
Yuri N. Makarov
OriginalPaper 10 February 2011 Pages: 165 - 170
Bonding and Cohesive Properties of Cobalt/Alumina Magnetic Tunnel Junctions
I. I. Oleinik
E. Yu Tsymbal
D. G. Pettifor
OriginalPaper 10 February 2011 Pages: 171 - 176
Excimer Pulsed Laser Ablated Molecular Beam Evaporation for the Deposition of Binary Skutterudites
H.-A. Durand
A. Suzuki
I. Kataoka
OriginalPaper 10 February 2011 Pages: 177 - 182
Atomistic Modeling of Ultrathin Fe Films on Cu (111)
A. Rakotomahevitra
L. T. Wille
M. S. Rakotomalala
OriginalPaper 10 February 2011 Pages: 183 - 188
Nitrogen Incorporation and Growth Kinetics of GaAsN/GaAs Epilayers Grown by MOVPE
Laurent Auvray
Hervé Dumont
Jean Bouix
OriginalPaper 10 February 2011 Pages: 189 - 194
Diamond Synthesis on Glassy Substrate With Completely Closed Reaction Chamber
Rie Hayashi
Fumitomo Onishi
Yoshiki Takagi
OriginalPaper 10 February 2011 Pages: 195 - 197
High-J_c YBCO Conductors Fabricated By Magnetron Deposition
N. Savvides
S. Gnanarajan
A. Molodyk
OriginalPaper 10 February 2011 Pages: 199 - 204
Strongly (111) Oriented Metallization by Ion Plating Method
T. Kudo
S. Sakuragi
M. Tanaka
OriginalPaper 10 February 2011 Pages: 205 - 210
Atomic Layer Deposition of TiN on Si (100) and (111) Substrates
Hyeongtag Jeon
Jae-Hyoung Koo
Young Do Kim
OriginalPaper 10 February 2011 Pages: 211 - 216
Microstructure and Nanomechanical Properties of Amorphous Carbon Thin Films Prepared by Pulsed Laser Deposition in Various Atmospheres
Q. Wei
S. Yamolenko
J. Narayan
OriginalPaper 10 February 2011 Pages: 217 - 222
In Situ Analysis Gaseous Species for CVD Diamond Synthesis and the Possible Reaction Model
Mayu Uede
Yoshiki Takagi
OriginalPaper 10 February 2011 Pages: 223 - 226
Modeling of PVT Growth of Bulk SiC Crystals: General Trends and 2” to 4” Reactor Scaling
M. S. Ramm
A. V. Kulik
Yu N. Makarov
OriginalPaper 10 February 2011 Pages: 227 - 233
A Hollow-Cathode Transient Plasma Process for Thin Film Growth
S. Witanachchi
P. Mahawela
P. Mukherjee
OriginalPaper 10 February 2011 Pages: 235 - 240
Synthesis and Characterization of α-Alumina Films Via Combustion Chemical Vapor Deposition
G. Grandinetti
S. Shanmugham
J. M. Hampikian
OriginalPaper 10 February 2011 Pages: 241 - 246

Volume 616, Issue 1

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