Volume 424, Issue 1

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December 1996

Symposium H — Flat Panel Display Materials II

Issue Editors:

F. Funada,
M.K. Hatalis,
J. Kanicki,
C.J. Summers

76 articles in this issue

Amorphous Silicon TFTs and Flat Panel Displays
T. Tsukada
OriginalPaper 10 February 2011 Pages: 3 - 8
High Deposition Rate a-Si:H for the Flat Panel Display Industry
J. Hautala
Z. Saleh
S. Wagner
OriginalPaper 10 February 2011 Pages: 9 - 18
Surface Roughness of Silicon-Nitride Gate Insulators Deposited in a 40-MHZ Glow Discharge
H. Meiling
E. Ten Grotenhuis
J. F. M. Westendorp
OriginalPaper 10 February 2011 Pages: 19 - 24
A Novel Device Structure for High Voltage, High Performance Amorphous Silicon Thin-Film Transistors
A. M. Miri
P. S. Gudem
A. Nathan
OriginalPaper 10 February 2011 Pages: 25 - 30
Hot-Wire Deposited Amorphous Silicon Thin-Film Transistors
R.E.I. Schropp
K.F. Feenstra
H. Meiling
OriginalPaper 10 February 2011 Pages: 31 - 36
Nanostructure and Electrical Properties of Anodized Al Gate Insulators for Thin-Film Transistors
Toshiaki Arai
Yasunobu Hiromasu
Satoshi Tsuji
OriginalPaper 10 February 2011 Pages: 37 - 42
High-Rate Deposited Amorphous Silicon Nitride for the Hydrogenated Amorphous Silicon Thin-Film Transistor Structures
Tong Li
Chun-ying Chen
Jerzy Kanicki
OriginalPaper 10 February 2011 Pages: 43 - 51
An Amorphous Silicon Thin Film Transistor Fabricated at 125°C by dc Reactive Magnetron Sputtering
C. S. McCormick
C. E. Weber
J. R. Abelson
OriginalPaper 10 February 2011 Pages: 53 - 57
Improved a-Si:H TFT Performance Using a-Si_xN_1-x / a-Si_xC_1-x Stack Dielectrics
G. Lavareda
E. Fortunato
R. Martins
OriginalPaper 10 February 2011 Pages: 59 - 64
Amorphous Silicon TFTs on Steel-Foil Substrates
S. D. Theiss
S. Wagner
OriginalPaper 10 February 2011 Pages: 65 - 70
a-Si:H TFTs Patterned Using Laser-Printed Toner
Helena Glesková
S. Wagner
D.S. Shen
OriginalPaper 10 February 2011 Pages: 71 - 76
Influence of the Density of States and Series Resistance on the Field-Effect Activation Energy in a-Si:H TFT
Chun-ying Chen
Jerzy Kanicki
OriginalPaper 10 February 2011 Pages: 77 - 83
Investigation of the off-current in amorphous silicon thin film transistors for SiO₂ and SiN_x gate insulators
Jeong Hyun Kim
Woong Sik Choi
Hoe Sup Soh
OriginalPaper 10 February 2011 Pages: 85 - 90
Physics of Below Threshold Current Distribution in a-Si:H TFTs
H. C. Slade
M. S. Shur
M. Hack
OriginalPaper 10 February 2011 Pages: 91 - 96
Energy Levels of Defects in a-Si:H from Optical and Electrical Characteristics
T. Globus
OriginalPaper 10 February 2011 Pages: 97 - 102
Low Temperature Growth of Nanocrystalline Silicon from SiF₄ + SiH₄
Yu Chen
M. Taguchi
S. Wagner
OriginalPaper 10 February 2011 Pages: 103 - 107
Hydrogen Behavior in PECVD Nitride by SiH₄ & ND₃ During RTA
S. S. He
V. L. Shannon
T. Nguyen
OriginalPaper 10 February 2011 Pages: 109 - 114
Characteristics of XeCl Excimer-Laser Annealed Insulator
Keun-Ho Jang
Hong-Seok Choi
Min- Koo Han
OriginalPaper 10 February 2011 Pages: 115 - 118
Material Properties of Sipos Films Prepared by XeCl Excimer Laser Annealing of a-Si:N_x Films
Hong-Seok Choi
Jae-Hong Jun
Min-Koo Han
OriginalPaper 10 February 2011 Pages: 119 - 123
Low Temperature Polysilicon Materials and Devices
D. Pribat
P. Legagneux
O. Huet
OriginalPaper 10 February 2011 Pages: 127 - 140
Low Energy Ion Doping Technology for Poly-Si TFTs
A. Mimura
M. Nagai
Y. Shinagawa
OriginalPaper 10 February 2011 Pages: 141 - 151
Electrical Performance of an N-Channel TFT Fabricated on a Quartz Substrate by ZMR
Si-Woo Lee
Seung-Ki Joo
In-Gon Lim
OriginalPaper 10 February 2011 Pages: 153 - 158
Polysilicon Thin Film Transistors with Cobalt amd Nickel Silicide Source and Drain Contacts
G.T. Sarcona
M.K. Hatalis
OriginalPaper 10 February 2011 Pages: 159 - 164
Helical Resonator Plasma Oxidation of Amorphous and Polycrystalline Silicon for Flat Panel Displays
Sita R. Kaluri
Robert S. Howell
Miltiadis K. Hatalis
OriginalPaper 10 February 2011 Pages: 165 - 170
Performance of Poly-Si TFTs with Double Gate Oxide Layers
Byung-Hyuk Min
Cheol-Min Park
and Min-Koo Han
OriginalPaper 10 February 2011 Pages: 171 - 176
Novel N₂O Plasma Passivation on Polycrystalline Silicon Thin-Film Transistors
Fang-Shing Wang
Chun-Yao Huang
Huang-Chung Cheng
OriginalPaper 10 February 2011 Pages: 177 - 181
The Poly-Si TFTs Fabricated by Novel Oxidation Method with Intermediate Oxide
C-M Park
J-S Yoo
M-K Han
OriginalPaper 10 February 2011 Pages: 183 - 187
ECR Plasma Oxidation of Amorphous Silicon for Improvement of the Interface State in a Poly Silicon Thin Film Transistor
Tae-Hyung Ihn
Seok-Woon Lee
Seung-Ki Joo
OriginalPaper 10 February 2011 Pages: 189 - 194
Device Characteristics of a Poly-Silicon Thin Film Transistor Fabricated by MILC at Low Temperature
Seok-Woon Lee
Byung-Il Lee
Seung-Ki Joo
OriginalPaper 10 February 2011 Pages: 195 - 200
Improvement of Poly-Silicon Thin Films and Thin Film Transistors using Ultrasound Treatment
S. Ostapenko
L. Jastrzebski
R.K. Smeltzer
OriginalPaper 10 February 2011 Pages: 201 - 206
A New Electrically Reversible Depassivation/Passivation Mechanism in Polycrystalline Silicon
Vyshnavi Suntharalingam
Stephen J. Fonash
OriginalPaper 10 February 2011 Pages: 207 - 212
AC and DC Characterization and Spice Modeling of Short Channel Polysilicon TFTs
M.D. Jacunski
M.S. Shur
M. Hack
OriginalPaper 10 February 2011 Pages: 213 - 218
Solution Grown Polysilicon for Flat Panel Displays
R. L. Wallace
W. A. Anderson
OriginalPaper 10 February 2011 Pages: 219 - 223
Copper-Enhanced Solid Phase Crystallization of Amorphous Silicon Films
Dong Kyun Sohn
Dae Gyu Moon
Byung Tae Ahn
OriginalPaper 10 February 2011 Pages: 225 - 230
Solid-Phase Crystallization of Amorphous Si_0.7Ge_0.3/Si and Si/Si_0.7Ge_0.3 Bilayer Films on SiO₂
Tae-Hoon Kim
Myung-Kwan Ryu
Ki-Bum Kim
OriginalPaper 10 February 2011 Pages: 231 - 236
Comparison Between Rapid Thermal and Furnace Annealing for A-Si Solid Phase Crystallization
Reece Kingi
Yaozu Wang
Howard Hovagimian
OriginalPaper 10 February 2011 Pages: 237 - 241
Polycrystalline Silicon Films Formed by Solid-Phase Crystallization of Amorphous Silicon: The Substrate Effects on Crystallization Kinetics and Mechanism
Y.-H. Song
S.-Y. Kang
J. Y. Lee
OriginalPaper 10 February 2011 Pages: 243 - 248
Approaches to modifying solid phase crystallization kinetics for a-Si films
Reece Kingi
Yaozu Wang
Yuan-Min Li
OriginalPaper 10 February 2011 Pages: 249 - 254
Effects of Germanium on Grain size and surface roughness of the solid phase crystallized polycrystalline Si_1-xGe_x films
Jin-Won Kim
Myung-Kwan Ryu
Sang-Joo Kim
OriginalPaper 10 February 2011 Pages: 255 - 260
Characterization of Polysilicon films using atomic force microscopy
Francis P. Fehlner
Chad B. Moore
J. Greg Couillard
OriginalPaper 10 February 2011 Pages: 261 - 266
A novel technique for in-situ monitoring of crystallinity and temperature during rapid thermal annealing of thin Si/Si-Ge films on quartz/glass
V. Subramanian
F. L Degertekin
K.C. Saraswat
OriginalPaper 10 February 2011 Pages: 267 - 272
Atomic-Ratio effect of transition layer for linear mobility in poly-Si TFTs
M.Y. Jung
Y.H. Jung
H.S. Soh
OriginalPaper 10 February 2011 Pages: 273 - 279
TMCTS for gate dielectric in thin film transistors
Albert W. Wang
Navakanta Bhat
Krishna C. Saraswat
OriginalPaper 10 February 2011 Pages: 281 - 286
Effect of annealing ambient on performance and reliability of low pressure chemical vapor deposited oxides for thin film transistors
N. Bhat
A. Wang
K. C. Saraswat
OriginalPaper 10 February 2011 Pages: 287 - 292
Liquid-crystals for multimedia display use: Materials and their physical properties
S. Naemura
OriginalPaper 10 February 2011 Pages: 295 - 310
The effect of phenyl benzoate self-assembled monolayers on liquid crystal alignment
R. J. Ondris-Crawford
L. M. Lander
R. J. Twieg
OriginalPaper 10 February 2011 Pages: 311 - 316
Suspended particle display using novel complexes
H. Takeuchi
A. Usuki
K. Tojima
OriginalPaper 10 February 2011 Pages: 317 - 322
Cr/Cr Compound Bilayered Thin Film Black Matrix for LCD Color Filter
Byung Hak Lee
Iee Gon Kim
Si-Hyun Lee
OriginalPaper 10 February 2011 Pages: 323 - 328
Development of Organic Photoresist for Color Filter Black Matrix
C. W. Kim
S. G. Rho
H. G. Yang
OriginalPaper 10 February 2011 Pages: 329 - 334
Effect of Base Pressure in Sputter Deposition on Characteristics of Indium Tin Oxide Thin Film
Byung Hak Lee
Choong-Hoon Yi
Si-Hyun Lee
OriginalPaper 10 February 2011 Pages: 335 - 340

Volume 424, Issue 1

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