Volume 415, Issue 1

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December 1995

Symposium BB — Metal-Organic Chemical Vapor Deposition of Electronic Ceramics II

Issue Editors:

D.B. Beach,
P.C. Van Buskirk,
S.B. Desu

37 articles in this issue

Growth via MOCVD and Characterization of GaN and AI_XGa_1−xN(0001) Alloys for Optoelectronic and Microelectronic Device Applications
Robert F. Davis
T. W. Weeks Jr.
W. G. Perry
OriginalPaper 01 January 1996 Pages: 3 - 14
MOCVD of SrS and SrS:Ce Thin Films for Electroluminescent Flat Panel Displays
John A. Samuels
David C. Smith
J. F. Wager
OriginalPaper 01 January 1996 Pages: 15 - 20
MOCVD of the Blue Electro-luminescent Phosphor CaGa₂S₄:Ce from a Liquid Reagent Delivery System
T. S. Moss
R. C. Dye
C. F. Schaus
OriginalPaper 01 January 1996 Pages: 21 - 29
The Properties of GaInAsSb/GaSb Heterostructure Grown by MOCVD and p-GaInAsSb/n-GaSb Photodiodes
Baolin Zhang
Yixin Jin
Shuwei Li
OriginalPaper 01 January 1996 Pages: 31 - 36
MOCVD Growth of Ga_xIn_1−XAs_1−YSb_y and Ga_xIn_1−xSb Alloys: Effect of Growth Parameters on Their Solid Compositions
Baolin Zhang
Tianming Zhou
Yixin Jin
OriginalPaper 01 January 1996 Pages: 37 - 43
Silicon Nitride Tools Coated with TiC Or TiN Composite Diamond Structures
W. D. Fan
K. Jagannadham
J. Narayan
OriginalPaper 01 January 1996 Pages: 45 - 50
Characterization of Amorphous Carbon Films Based on Carbon, Nitrogen, and Hydrogen.
H. Efstathiadis
Z. Akkerman
F. W. Smith
OriginalPaper 01 January 1996 Pages: 51 - 56
Improvement of PECVD-SiNx for TFT Gate Insulator by Controlling Ion Bomberdment Energy
Yasuhiko Kasama
Tadahiro Ohmi
Shoich Ono
OriginalPaper 01 January 1996 Pages: 57 - 64
MOCVD Routes to Thin Films for Superconducting Applications. Precursor Synthesis and Film Processing Issues
T. J. Marks
J. A. Belot
C. R. Kannewurf
OriginalPaper 01 January 1996 Pages: 67 - 78
From Proposal to Product: Scaling Up the Chemical Synthesis of MOCVD Oxide Precursors
T. J. Leedham
OriginalPaper 01 January 1996 Pages: 79 - 85
Group 13–16 Precursors: What Controls Their Volatility?
Edward G. Gillan
Simon G. Bott
Andrew R. Barron
OriginalPaper 01 January 1996 Pages: 87 - 92
Development of Novel Nickel(β–Diketonate)₂. Ligand Complexes as Precursors for Mocvd of Nickel and Nickel Oxide
Carel I. M. A. Spee
Hans L. Linden
Harry A. Meinema
OriginalPaper 01 January 1996 Pages: 93 - 98
Barium bis(β-Diketonate)●tetraglyme Complexes as Potential CVD Precursors for Electronic Materials
Henry A. Luten III
David J. Otway
William S. Rees Jr.
OriginalPaper 01 January 1996 Pages: 99 - 104
An Investigation Into the Role of Incorporated Solvent (EtOH/H₂O) Molecules on the Structure of Group 2 Metal bis(β-Diketonate) Complexes: Ramifications for CVD Precursors of Electronic Materials.
David J. Otway
Henry A. Luten
William S. Rees Jr.
OriginalPaper 01 January 1996 Pages: 105 - 110
Erbium Tris(Amide) Compounds as Source Molecules for Rare Earth Doping of Semiconducting Materials
Oliver Just
Anton C. Greenwald
William S. Rees Jr.
OriginalPaper 01 January 1996 Pages: 111 - 116
Zinc Bis(Amide) Compounds Evaluated as Designed Precursors for Site-Selective P-type Doping of ZnSe
David A. Gaul
Oliver Just
William S. Rees Jr.
OriginalPaper 01 January 1996 Pages: 117 - 121
Liquid Delivery MOCVD of Ferroelectric PZT
J. F. Roeder
B. A. Vaartstra
H. R. Beratan
OriginalPaper 01 January 1996 Pages: 123 - 128
Reproducible Growth of Highly Oriented (OO1) YSZ Films on Amorphous SiO₂ Substrates by MOCVD
G. Doubinina
G. T. Stauf
OriginalPaper 01 January 1996 Pages: 129 - 134
Thermodynamic Analysis, a Useful Tool for MOCVD
C. Bernard
A. Pisch
R. Madar
OriginalPaper 01 January 1996 Pages: 137 - 148
MOCVD HTSC Precursor Delivery Monitored by UV Spectroscopy
Brian J. Rappoli
William J. DeSisto
OriginalPaper 01 January 1996 Pages: 149 - 154
APCVD - In-Situ Growing and Investigation of Electrochromic WO₃ Films
K. A. Gesheva
G. Stoyanov
D. Gogova
OriginalPaper 01 January 1996 Pages: 155 - 160
A Study on the Thermal Decomposition of Ba(tmhd)₂ and Sr(tmhd)₂
Hyun-Kyu Ryu
Jae Hyun Han
Sang Heup Moon
OriginalPaper 01 January 1996 Pages: 161 - 166
Advanced Interactive Personal Computer-Based Process Control Systems for Oxide MOCVD Systems.
G. S. Tompa
D. Shen
Y. Chen
OriginalPaper 01 January 1996 Pages: 167 - 172
BaTiO₃ Thin Films for Electro-optic and Non-linear Optical Applications
B.A. Block
B.W. Wessels
OriginalPaper 01 January 1996 Pages: 175 - 182
Preparation and Characterization of SrTiO₃ Thin Films Using ECR Plasma Assisted MOCVD
Joon Sung Lee
Han Wook Song
Kwangsoo No
OriginalPaper 01 January 1996 Pages: 183 - 188
The Microstructure and Properties of Layered Oxide Thin Films Fabricated by MOCVD
Tingkai Li
Yongfei Zhu
Masaya Nagata
OriginalPaper 01 January 1996 Pages: 189 - 194
Preparation and properties of ferroelectric Bi₂SrTa₂O₉ thin films for FeRAM using Flash-MOCVD
T. Ami
K. Hironaka
M. Tanaka
OriginalPaper 01 January 1996 Pages: 195 - 200
The Microstructure of SrBi₂Ta₂O₉ Films
C. D. Gutleben
Y. Ikeda
E. Morita
OriginalPaper 01 January 1996 Pages: 201 - 206
High Temperature X-Ray Diffraction Study of PbTiO₃ Thin Films Grown on MgO(001) By MOCVD
R. S. Batzer
Biming Yen
Haydn Chen
OriginalPaper 01 January 1996 Pages: 207 - 212
The Preparation and Characterization of Lithium Cobalt Oxide Thin Films by LPCVD
L. T. Kenny
R. C. Breitkopf
R. B. Goldner
OriginalPaper 01 January 1996 Pages: 213 - 217
Dielectric Behavior of CVD (Ba, Sr) TiO₃ Thin Films on Pt/Si
S. K. Streiffer
C. Basceri
P. C. van Buskirk
OriginalPaper 01 January 1996 Pages: 219 - 224
MOCVD of Very Thin Films of Lead Lanthanum Titanate
David B. Beach
Catherine E. Vallet
OriginalPaper 01 January 1996 Pages: 225 - 230
MOCVD of SnO₂ on Silicon Microhotplate Arrays for Use in Gas Sensing Applications
F. Dimeo Jr.
S. Semancik
N. H. Tea
OriginalPaper 01 January 1996 Pages: 231 - 236
Study of Microstructure and Gas Sensing Properties of Tin Oxide Thin Films Prepared by Metal Organic Chemical Vapor Deposition
Sang Woo Lee
Donhang Liu
Haydn Chen
OriginalPaper 01 January 1996 Pages: 237 - 242
Room Temperature Deposition of High Dielectric Constant, High Density Ceramic Thin Films
K. Chen
M. Nielsen
T.-M. Lu
OriginalPaper 01 January 1996 Pages: 243 - 248
Chemical Vapor Deposition of Oxides from Alkoxides
R. Xu
OriginalPaper 01 January 1996 Pages: 249 - 253
Liquid Source MOCVD of High Quality YBa₂Cu₃O_7−x Films on Polycrystalline and Amorphous Substrates
D. B. Studebaker
G. Doubinina
T. J. Marks
OriginalPaper 01 January 1996 Pages: 255 - 260

Volume 415, Issue 1

Growth via MOCVD and Characterization of GaN and AI_XGa_1−xN(0001) Alloys for Optoelectronic and Microelectronic Device Applications

MOCVD of SrS and SrS:Ce Thin Films for Electroluminescent Flat Panel Displays

MOCVD of the Blue Electro-luminescent Phosphor CaGa₂S₄:Ce from a Liquid Reagent Delivery System

The Properties of GaInAsSb/GaSb Heterostructure Grown by MOCVD and p-GaInAsSb/n-GaSb Photodiodes

MOCVD Growth of Ga_xIn_1−XAs_1−YSb_y and Ga_xIn_1−xSb Alloys: Effect of Growth Parameters on Their Solid Compositions

Silicon Nitride Tools Coated with TiC Or TiN Composite Diamond Structures

Characterization of Amorphous Carbon Films Based on Carbon, Nitrogen, and Hydrogen.

Improvement of PECVD-SiNx for TFT Gate Insulator by Controlling Ion Bomberdment Energy

MOCVD Routes to Thin Films for Superconducting Applications. Precursor Synthesis and Film Processing Issues

From Proposal to Product: Scaling Up the Chemical Synthesis of MOCVD Oxide Precursors

Group 13–16 Precursors: What Controls Their Volatility?

Development of Novel Nickel(β–Diketonate)₂. Ligand Complexes as Precursors for Mocvd of Nickel and Nickel Oxide

Barium bis(β-Diketonate)●tetraglyme Complexes as Potential CVD Precursors for Electronic Materials

An Investigation Into the Role of Incorporated Solvent (EtOH/H₂O) Molecules on the Structure of Group 2 Metal bis(β-Diketonate) Complexes: Ramifications for CVD Precursors of Electronic Materials.

Erbium Tris(Amide) Compounds as Source Molecules for Rare Earth Doping of Semiconducting Materials

Zinc Bis(Amide) Compounds Evaluated as Designed Precursors for Site-Selective P-type Doping of ZnSe

Liquid Delivery MOCVD of Ferroelectric PZT

Reproducible Growth of Highly Oriented (OO1) YSZ Films on Amorphous SiO₂ Substrates by MOCVD

Thermodynamic Analysis, a Useful Tool for MOCVD

MOCVD HTSC Precursor Delivery Monitored by UV Spectroscopy

APCVD - In-Situ Growing and Investigation of Electrochromic WO₃ Films

A Study on the Thermal Decomposition of Ba(tmhd)₂ and Sr(tmhd)₂

Advanced Interactive Personal Computer-Based Process Control Systems for Oxide MOCVD Systems.

BaTiO₃ Thin Films for Electro-optic and Non-linear Optical Applications

Preparation and Characterization of SrTiO₃ Thin Films Using ECR Plasma Assisted MOCVD

The Microstructure and Properties of Layered Oxide Thin Films Fabricated by MOCVD

Preparation and properties of ferroelectric Bi₂SrTa₂O₉ thin films for FeRAM using Flash-MOCVD

The Microstructure of SrBi₂Ta₂O₉ Films

High Temperature X-Ray Diffraction Study of PbTiO₃ Thin Films Grown on MgO(001) By MOCVD

The Preparation and Characterization of Lithium Cobalt Oxide Thin Films by LPCVD

Dielectric Behavior of CVD (Ba, Sr) TiO₃ Thin Films on Pt/Si

MOCVD of Very Thin Films of Lead Lanthanum Titanate

MOCVD of SnO₂ on Silicon Microhotplate Arrays for Use in Gas Sensing Applications

Study of Microstructure and Gas Sensing Properties of Tin Oxide Thin Films Prepared by Metal Organic Chemical Vapor Deposition

Room Temperature Deposition of High Dielectric Constant, High Density Ceramic Thin Films

Chemical Vapor Deposition of Oxides from Alkoxides

Liquid Source MOCVD of High Quality YBa₂Cu₃O_7−x Films on Polycrystalline and Amorphous Substrates

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