Volume 33, Issue 1

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December 1984

Symposium D — Comparison of Thin Film Transistor and SOI Technologies

Issue Editors:

H.W. Lam,
M.J. Thompson

40 articles in this issue

The Current Status of Silicon-On-Sapphire and other Heteroepitaxial Silicon-On-Insulator Technologies
I. Golecki
OriginalPaper 21 February 2011 Pages: 3 - 23
CMOS/SOS VLSI Technology
Tai Sato
Jun Iwamura
Katsuyuki Doi
OriginalPaper 21 February 2011 Pages: 25 - 34
Characterization of CMOS Devices in 0.5-µm Silicon-On-Sapphire Films Modified by Solid Phase Epitaxy and Regrowth (SPEAR)
P. K. Vasudev
D. C. Mayer
OriginalPaper 21 February 2011 Pages: 35 - 39
Silicon on Insulator by High Dose Implantation
P. L. F. Hemment
OriginalPaper 21 February 2011 Pages: 41 - 51
The Formation of Porous Silicon and its Applications to Dielectric Isolation
R. C. Frye
OriginalPaper 21 February 2011 Pages: 53 - 62
Dielectric Isolation Using Porous Silicon
H. Baumgart
R. C. Frye
H. J. Leamy
OriginalPaper 21 February 2011 Pages: 63 - 68
Incoherent Light Recrystallization of Silicon-On-Insulator Films
McD. Robinson
G. K. Celler
D. J. Lischner
OriginalPaper 21 February 2011 Pages: 71 - 80
Lateral Seeding of Silicon-On-Insulator Using an Elliptical Laser Beam: A Comparison of Scanning Methods
P. Zorabedian
T. I. Kamins
OriginalPaper 21 February 2011 Pages: 81 - 86
Structural Properties of Dielectric Layers Following CO₂ Laser Irradiation of SOI Structures
H. Baumgart
E. Arnold
M. H. Frommer
OriginalPaper 21 February 2011 Pages: 87 - 92
Line-Source Processing of SOI Structures with Laser and Electron Beam
Leslie J. Palkuti
Chan-Sui pang
OriginalPaper 21 February 2011 Pages: 93 - 99
Electronic Deep Levels in Laser–Crystallized Silicon Thin-Film MOS Capacitors on Fused Silica
N. M. Johnson
M. D. Moyer
OriginalPaper 21 February 2011 Pages: 101 - 108
Laser-Recrystallized SOI Devices: Promises and Pitfalls
T. I. Kamins
OriginalPaper 21 February 2011 Pages: 109 - 118
NMOS Dynamic Shift Registers in CO₂ Laser-Crystallized Silicon Thin-Films on Fused Quartz
Anne Chiang
Mark H. Zarzycki
Noble M. Johnson
OriginalPaper 21 February 2011 Pages: 119 - 126
Influence of Crystalline Structure on Performance of Thin Film Transistors
G. K. Celler
K. K. Ng
E. I. Povilonis
OriginalPaper 21 February 2011 Pages: 127 - 132
Offset-Gate Structures for Increased Breakdown Voltages in Silicon-On-Insulator Transistors
C. I. Drowley
T. I. Kamins
OriginalPaper 21 February 2011 Pages: 133 - 138
Electrical Characterization of Laser/Energy-Beam Recrystallized Thin Film Silicon-On-Insulator (SOI)
El-Hang Lee
D. J. Ruprecht
OriginalPaper 21 February 2011 Pages: 139 - 144
A 3-D Integration Strategy in VLSI
Satwinder D. S. Malhi
OriginalPaper 21 February 2011 Pages: 147 - 148
3-Dimensional Integration Fabricated by Using Seeded Lateral Epitaxial Film on SiO₂
N. Sasaki
T. Iwai
M. Nakano
OriginalPaper 21 February 2011 Pages: 149 - 154
Vertical, Dual Gate CMOS Structure in Two Laser-Recrystallized Silicon Layers over Oxidized Silicon Substrate
P. Kenyon
H. Dressel
A. Negri
OriginalPaper 21 February 2011 Pages: 155 - 160
Staggered CMOS: A Novel Three-Dimensional Technology
E. W. Maby
D. A. Antoniadis
OriginalPaper 21 February 2011 Pages: 161 - 166
Polysilicon Grain Growth by Rapid Isothermal Annealing
R. F. Pinizzotto
F. Y. Clark
R. R. Shah
OriginalPaper 21 February 2011 Pages: 169 - 178
Observations of Damage and Transport of Hydrogen in ION Bombarded Polycrystalline Silicon
D. J. Sharp
J. K. G. Panitz
C. H. Seager
OriginalPaper 21 February 2011 Pages: 179 - 186
An Epitaxial Regrowth of Polysilicon to Single Crystal Silicon By H₂ Annealing Process
Yuichi Hirofuji
Noboru Nomura
Koichi Kugimiya
OriginalPaper 21 February 2011 Pages: 187 - 192
N-Channel and P-Channel LPCVD Polysilicon Mosfet’s and Effects of Grain Boundary Passivation
H. Shichijo
S. D. S. Malhi
H. W. Lam
OriginalPaper 21 February 2011 Pages: 193 - 198
Effects of Grain Boundaries on the Current-Voltage Characteristics of SOI Mosfets
Jerry G. Fossum
Adelmo Ortiz-Conde
OriginalPaper 21 February 2011 Pages: 199 - 206
Modeling of Polysilicon Resistors, P-N Junction Diodes and Mosfet’s
A. N. Khondker
S. S. Ahmed
D. M. Kim
OriginalPaper 21 February 2011 Pages: 207 - 212
Display Quality SOI by Recrystallization of Bridged Silicon Islands on Quartz
C. S. Bak
P. O. Braatz
J. D. Margerum
OriginalPaper 21 February 2011 Pages: 215 - 220
Laser Recrystallization Technique for Active Matrix LC Display
T. Nishimura
A. Ishizu
Y. Akasaka
OriginalPaper 21 February 2011 Pages: 221 - 230
Liqiuid Crystal Display Fabricated from Laser Recrystallized Silicon on Bulk Fused Silica
W. G. Hawkins
D. J. Drake
P. J. Hartman
OriginalPaper 21 February 2011 Pages: 231 - 236
Applications of CdSe Thin Film Transistors in Flat Panel Displays
Fang-Chen Luo
OriginalPaper 21 February 2011 Pages: 239 - 245
Amorpiious Silicon Thin Film Transistor and its Applications to Large-Area Electironics
H. C. Tuan
OriginalPaper 21 February 2011 Pages: 247 - 257
Material Properties Controlling the Performance of Amorphous Silicon Thin Film Transistors
M. J. Powell
OriginalPaper 21 February 2011 Pages: 259 - 273
Amorphous Si:H Linear Image Sensor Operated by a-Si:H TFT Array
F. Okumura
S. Kaneko
OriginalPaper 21 February 2011 Pages: 275 - 280
a-Si:H TFT: Potential Suitabilities for Gate and Source-Drain Self-Aligned Structure
B. Diem
A. Chenevas-Paule
OriginalPaper 21 February 2011 Pages: 281 - 285
Vertical-Type a-Si:H Field-Effect Transistors
Yasutaka Uchida
Masakiyo Matsumura
OriginalPaper 21 February 2011 Pages: 287 - 292
A One-Micrometer Channel Length α-Si Thin-Film Field-Effect Transistor
Z. Yaniv
G. Hansell
V. Cannella
OriginalPaper 21 February 2011 Pages: 293 - 296
Impurities in Bulk A-Si:H, Silicon Nitride, and at the a-Si:H/Silicon Nitride Interface
C. C. Tsai
M. J. Thompson
H. C. Tuan
OriginalPaper 21 February 2011 Pages: 297 - 300
Semitransparent Silicide Electrode Formed on the Surface of a-Si:H
T. Tsukada
K. Seki
A. Sasano
OriginalPaper 21 February 2011 Pages: 301 - 306
Characteristics of Amorphous Silicon Based Alloy Field Effect Transistors
M. Shur
M. Hack
C. Hyun
OriginalPaper 21 February 2011 Pages: 307 - 312
Attempts to Apply Thin Film Transistors to Electroluminescent Displays
M. Robert Miller
OriginalPaper 21 February 2011 Pages: 313 - 318

Volume 33, Issue 1

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