Volume 259, Issue 1

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December 1992

Symposium B — Chemical Surface Preparation, Passivation and Cleaning for Semiconductor Growth and Processing

Issue Editors:

C. Robert Helms,
Masataka Hirose,
Robert J. Nemanich,
Gary W. Rubloff

75 articles in this issue

Science Issues Related to Wafer Cleaning in Silicon Technology
M. Liehr
OriginalPaper 01 January 1992 Pages: 3 - 18
In Situ Control of Native Oxide Growth for Semiconductor Processes
Mizuho Morita
Tadahiro Ohmi
OriginalPaper 01 January 1992 Pages: 19 - 29
Chemical Structures of Native Oxides Formed During Wet Chemical Treatments on NH₄F Treated Si(111) Surfaces
Takeo Hattori
Hiroki Ogawa
OriginalPaper 01 January 1992 Pages: 31 - 42
In Situ Low Temperature Cleaning and Passivation of Silicon by Remote Hydrogen Plasma for Silicon-Based Epitaxy
S. Banerjee
A. Tasch
S. Thomas
OriginalPaper 01 January 1992 Pages: 43 - 54
Surface Conditioning Issues Related to Patiterning and Etching
S. J. Fonash
R. A. Ditizio
Y. D. Chan
OriginalPaper 01 January 1992 Pages: 55 - 66
A New Two-Step Plasma-Assisted Surface Cleaningoxidation and Film-Deposition Process Sequence for The Formation of Si(100)/SiO₂ Interfaces with Low Densities of Interfacial Traps
Y. Ma
T. Yasuda
G. Lucovsky
OriginalPaper 01 January 1992 Pages: 69 - 74
Surface Cleaning Prior to Formation of Si/SiO₂ Interfaces by Remote Plasma-Enhanced Chemical Vapor Deposition (RPECVD)
H. H. Lamb
S. Kalem
G. Lucovsky
OriginalPaper 01 January 1992 Pages: 75 - 79
Influence of Surface Pre-Cleaning on Electrical Properties of Rapid Thermal Oxide and Rapid Thermal Chemical Vapor Deposition Oxide
Xiaoli Xu
R. T. Kuehn
D. Maher
OriginalPaper 01 January 1992 Pages: 81 - 86
Silicon Surface Morphology and the Reaction of Silicon with Oxygen
Frances M. Ross
J. Murray Gibson
OriginalPaper 01 January 1992 Pages: 87 - 91
Pre-Oxidation Anneal Kinetics: Interface Degradation of Thin SIO₂ Films on Silicon
J. C. Poler
E. A. Irene
OriginalPaper 01 January 1992 Pages: 93 - 98
Effects of Hydrogen Coverage on Silicon Surface Reactivity
A. C. Dillon
M. B. Robinson
P. Gupta
OriginalPaper 01 January 1992 Pages: 99 - 104
Cleaning Procedures for UHV Cluster-tool MOS Fabrication
C J Sofield
M P Murrell
J Barnes
OriginalPaper 01 January 1992 Pages: 105 - 111
Chemical Structure of Native Oxide Grown on Hydrogenterminated Silicon Surfaces
M. Takakura
T. Yasaka
M. Hirose
OriginalPaper 01 January 1992 Pages: 113 - 118
HF/Ethanol Preoxidation Silicon Cleaning: Analysis of the Silicon Surface and of the Ultra-Thin Oxide Layer
B. Garrido
F. Gessinn
G. Sarrabayrouse
OriginalPaper 01 January 1992 Pages: 119 - 124
Pre-oxidation Silicon Cleaning and its Relation to MOS Reliability and Process-Induced Damage
S. R. Kasi
G. W. Rubloff
L. C. Hsia
OriginalPaper 01 January 1992 Pages: 125 - 130
Ion Channeling and Spectroscopic Ellipsometry Examinations of Thin-Film SiO₂ /EPI-Si(001) Structures
A. T. Fiory
P. K. Roy
G. E. Jellison
OriginalPaper 01 January 1992 Pages: 131 - 135
Surface Cleaning and Passivation for the Growth of Si/Oxide/Si Structures
Kun-Chih Wang
Huey-Liang Hwang
Tri-Rung Yew
OriginalPaper 01 January 1992 Pages: 137 - 141
A Correlation between Si Surface Micro-Roughness and Atomic Concentration on Surface: Application to Micro-Roughness Measurement of Si
I. Oki
T. Biwa
H. Shibayama
OriginalPaper 01 January 1992 Pages: 143 - 147
Si Surface Preparation: The Effect of Small Amounts of Carbon Contamination and Sputter Induced Surface Roughness
Iain D. Baikie
OriginalPaper 01 January 1992 Pages: 149 - 153
Spectroscopic Ellipsometric Analysis of Surface and Subsurface Damage in Chemical-Mechanical Polished Semiconductors
Yi-Ming Xiong
Paul G. Snyder
OriginalPaper 01 January 1992 Pages: 155 - 160
Crystal Originated Singularities on Silicon Wafers After SC1 Cleaning
E. Morita
J. Ryuta
Y. Shimanuki
OriginalPaper 01 January 1992 Pages: 161 - 166
VPD/SIMS Measurement of Surface Al on Silicon Substrates
V. K. F. Chia
R. W. Odom
R. S. Hockett
OriginalPaper 01 January 1992 Pages: 167 - 172
TXRF Characterization of Trace Metal Contamination in Thin Gate Oxides
R. S. Hockett
Diane Hymes
OriginalPaper 01 January 1992 Pages: 173 - 178
In Situ Contamination Control Investigation of Silicon Nitride Low Pressure Chemical Vapor Deposition Process in Vertical Thermal Reactors
Mansour Moinpour
K. Bohannan
R. Wilkes
OriginalPaper 01 January 1992 Pages: 179 - 186
KOH-ETCH Related Defects on Processed Silicon Wafers
Laurent E. Kassel
OriginalPaper 01 January 1992 Pages: 187 - 192
Photo-Excited Cleaning of Silicon with Chlorine and Fluorine
T. Ito
R. Sugino
Y. Arimoto
OriginalPaper 01 January 1992 Pages: 195 - 205
Kinetics of UV/O₂ Cleaning and Surface Passivation: Experiments and Modeling
Satish Bedge
Joseph McFadyen
H. Henry Lamb
OriginalPaper 01 January 1992 Pages: 207 - 212
Plasma-Surface Interaction Limits for Remote H-Plasma Cleaning of Si(100)
T. P. Schneider
B. L. Bernhard
R. J. Nemanich
OriginalPaper 01 January 1992 Pages: 213 - 218
Characteristics and Recovery of SI Surfaces Plasma Etching in CHF₃ / C₂F₆
H.-H. Park
K.-H. Kwon
Y.-K. Sung
OriginalPaper 01 January 1992 Pages: 219 - 224
Surface Stability and Flow Characteristics of BPSG Film by N₂O Plasma Treatment
C. G. Kim
H. S. Lee
J. G. Lee
OriginalPaper 01 January 1992 Pages: 225 - 230
Detection of Thin Interfacial Layers by Picosecond Ultrasonics
G. Tas
R. J. Stoner
J. M. Halbout
OriginalPaper 01 January 1992 Pages: 231 - 236
Surface Electronic States of Low Temperature H-plasma Cleaned Si(100) and Ge(100) Surfaces
Jaewon Cho
T.P. Schneider
R.J. Nemanich
OriginalPaper 01 January 1992 Pages: 237 - 242
Silicon Surface Cleaning by A Plasma in Afterglow
B. Charlet
L. Peccoud
OriginalPaper 01 January 1992 Pages: 243 - 247
Single Step Low Temperature In-Situ Substrate Cleaning for Silicon Processing
Juergen Ramm
Eugen Beck
Ignaz Eisele
OriginalPaper 01 January 1992 Pages: 249 - 254
Comparison between Air and UV/Ozone Surfaces Passivation Methods of GaAs (100) Substrates
G. M. Ingo
G. Padeletti
A. Scandurra
OriginalPaper 01 January 1992 Pages: 255 - 260
Double Beam Photoconductivity Modulation System and its Application to the Characterization of a Process of Photoresist Removal
A. Usami
H. Fujiwara
T. Wada
OriginalPaper 01 January 1992 Pages: 261 - 266
Analysis of Plasma Oxidised Hg_1-xCd_xTe Surfaces
P. W. Leech
R. L. Moore
P. J. Stiles
OriginalPaper 01 January 1992 Pages: 269 - 274
The Wet Etching of CdZnTe Substrates for OMVPE Growth
T. W. Chan
X. J. Bao
E. I. Ko
OriginalPaper 01 January 1992 Pages: 275 - 280
Sulfidation and Post-Sulfidatton Reactions on Gallium Arsenide
J. Yota
V. A. Burrows
OriginalPaper 01 January 1992 Pages: 281 - 286
The Passivation of Gallium Arsenide Surfaces with Selenium from Gaseous Sources
C. Robert Helms
G. Y. Gu
K. A. R. Mitchell
OriginalPaper 01 January 1992 Pages: 287 - 292
S-Passivated InP Surfaces Prepared by (NH₄)₂S Treatments
Y. Tao
A. Yelon
M. J. Graham
OriginalPaper 01 January 1992 Pages: 293 - 298
Structure of Sulphur-Passivated InP(100)-(1x1) Surface
Z. H. Lu
Y. Tao
E. Sacher
OriginalPaper 01 January 1992 Pages: 299 - 304
MOCVD Growth of GaAs on Si with Low Temperature Preheating Process
N. Takagi
T. Eshita
K. Takasaki
OriginalPaper 01 January 1992 Pages: 305 - 310
Improvement in the Activation Efficiency of Implanted Si in GaAs using Oxygen Plasma Pretreatment
Jaeshin Cho
Leszek M. Pawlowicz
Naresh C. Saha
OriginalPaper 01 January 1992 Pages: 311 - 316
Study of the Surface Cleaning Effects to the InGaAs Quantum Well Wires by Atomic Force Microscopy and Photoluminescence Spectroscopy
I-Hsing Tan
Song Shi Stone
Paul Hansma
OriginalPaper 01 January 1992 Pages: 317 - 322
SHG(Second Harmonic Generation) in Reflection from GaAs Surfaces during Sulfur Passivation and Photochemical Washing Processes
Chikashi Yamada
Takahiro Kimura
Peter Fuqua
OriginalPaper 01 January 1992 Pages: 323 - 328
Surface Contamination Level of GaAs Wafers Treated with Solutions of Organic Base Measured by Total Reflection X-Ray Fluorescence (TXRF)
H. Shibaya
H. Kondo
K. Tomizawa
OriginalPaper 01 January 1992 Pages: 329 - 334
Surface Characterization of Chemical-Mechanical Polished GaAs by Inclined Bragg Plane Triple Crystal X-Ray Diffraction
Victor S. Wang
Richard J. Matyi
OriginalPaper 01 January 1992 Pages: 335 - 340
Texturing of InP Surfaces for Device Applications
Sheila G. Bailey
Navid S. Fatemi
Geoffrey A. Landis
OriginalPaper 01 January 1992 Pages: 341 - 346
Etching of Silicon (111) and (100) Surfaces in HF Solutions: H-Termination, Atomic Structure and Overall Morphology
Y. J. Chabal
OriginalPaper 01 January 1992 Pages: 349 - 360

Volume 259, Issue 1

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