Volume 1803, Issue 1 | MRS Online Proceedings Library

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Volume 1803, Issue 1

December 2015

Symposium QQ — Plasma-Based Materials Science and Engineering

Issue Editors:

D. Horwat,
M. Sankaran,
C. Clavero,
R. Gago

5 articles in this issue

Plasma-Reactor Wall Interactions: Bromine-Fluorine Chemistry Duality in an Industrial Dry Etch Process
M. Rizquez
A. Roussy
Y. Goasduff
OriginalPaper 11 June 2015 Article: 5
Morphology of Tantalum Nitride Thin Films Grown on Fused Quartz by Reactive High Power Impulse Magnetron Sputtering (HiPIMS)
D. O. Thorsteinsson
T. K. Tryggvason
J. T. Gudmundsson
OriginalPaper 25 May 2015 Article: 4
Size control of gas phase grown silicon nanoparticles by varying the plasma OFF time in silane pulsed plasma
A. Mohan
I. Poulios
J. K. Rath
OriginalPaper 18 May 2015 Article: 3
Optical Studies on VO₂ Thin Films
Lei Wang
Melissa Beebe
Rosa A. Lukaszew
OriginalPaper 14 May 2015 Article: 2
Submicronic etched features of silicon with high aspect ratio obtained by cryogenic plasma deep-etching through perforated polymer thin films
A. Vital
M. Boufnichel
M. Vayer
OriginalPaper 30 April 2015 Article: 1