Volume 1287, Issue 1 | MRS Online Proceedings Library

Search all MRS Online Proceedings Library articles

Volume 1287, Issue 1

December 2010

Symposium F — Low-Temperature-Processed Thin-Film Transistors

Issue Editor:

E. Fortunato

13 articles in this issue

Millisecond-annealing using flash lamps for improved performance of AZO layers
T. Gebel
M. Neubert
H. Liepack
OriginalPaper 01 January 2011 Article: 1010
Solution Processable Nanowire Field-Effect Transistors
Charles Opoku
Lichun Chen
Maxim Shkunov
OriginalPaper 01 January 2011 Article: 1003
Organic/Inorganic Hybrid-Type Nonvolatile Memory Thin-Film Transistor on Plastic Substrate below 150°C
Sung-Min Yoon
Shinhyuk Yang
Byoung-Gon Yu
OriginalPaper 01 January 2011 Article: 910
Characteristics of OTFTs Using Olefin-polymer Gate Insulator and Their Application to a 5-in. OTFT-driven Flexible AMOLED Display
Yoshiki Nakajima
Yoshihide Fujisaki
Shizuo Tokito
OriginalPaper 01 January 2011 Article: 909
Low Temperature Zinc Indium Oxide Backplane Development for Flexible OLED Displays in a Manufacturing Pilot Line Environment
Michael A. Marrs
Sameer M. Venugopal
David R. Allee
OriginalPaper 01 January 2011 Article: 902
Amorphous IGZO TFTs and Circuits on Highly Flexible and Dimensionally Stable Kovar (Ni-Fe alloy) Metal Foils
Shahrukh A. Khan
Xiaoxiao Ma
Miltiadis Hatalis
OriginalPaper 01 January 2011 Article: 816
Spin-On Glass as low temperature gate insulator
Miguel A. Domínguez
Pedro Rosales
Wilfrido Calleja
OriginalPaper 01 January 2011 Article: 810
Effects of Oxygen and Forming Gas Annealing on ZnO TFTs
Jiaye Huang
Ujwal Radhakrishna
Lothar Frey
OriginalPaper 01 January 2011 Article: 805
Development of ZnO/Ta₂O₅ heterojunction using low-temperature technological processes
R. Baca
J. A. Andraca
R. P. Sierra
OriginalPaper 01 January 2011 Article: 802
Capacitance-Voltage Measurement of an Ambipolar Pentacene Field Effect Transistor in Operation by Using Displacement Current Measurement
Yuya Tanaka
Yutaka Noguchi
Hisao Ishii
OriginalPaper 01 January 2011 Article: 306
Low-damage Preparation of SiO₂ Dielectric Thin Film by the Photo-assisted Oxidation Processing
Takehito Kodzasa
Sei Uemura
Toshihide Kamata
OriginalPaper 01 January 2011 Article: 207
Precursor design and engineering for low-temperature deposition of gate dielectrics for thin film transistors
Anupama Mallikarjunan
Laura M Matz
Bing Han
OriginalPaper 01 January 2011 Article: 206
Pressure Dependence on the Electrical Properties of SiO₂ Gate Oxide Formed by Inductive Coupled Plasma Oxidation
Beom-jong Kim
Dong-chan Kim
Chil-hee Chung
OriginalPaper 01 January 2011 Article: 205