Why In Situ, Real-Time Characterization of Thin-Film Growth Processes? Orlando AucielloAlan R. Krauss OriginalPaper 29 November 2013 Pages: 14 - 17
Time-of-Flight, Ion-Beam Surface Analysis for In Situ Characterization of Thin-Film Growth Processes Alan R. KraussOrlando AucielloJ. Albert Schultz OriginalPaper 29 November 2013 Pages: 18 - 23
In Situ Ellipsometry in Microelectronics E. A. IreneJ. A. Woollam OriginalPaper 29 November 2013 Pages: 24 - 28
Laser-Reflectance Interferometry Measurements of Diamond-Film Growth Christopher D. ZuikerDieter M. GruenAlan R. Krauss OriginalPaper 29 November 2013 Pages: 29 - 31
Analysis of Growing Films of Complex Oxides by RHEED Ivan BozovicJ. N. Eckstein OriginalPaper 29 November 2013 Pages: 32 - 38
Total-Reflection X-Ray Fluorescence Spectroscopy for In Situ, Real-Time Analysis of Growing Films T. A. RobertsK. E. Gray OriginalPaper 29 November 2013 Pages: 43 - 46
Real-Time Monitoring of Epitaxial Processes by Parallel-Polarized Reflectance Spectroscopy Nikolaus DietzKlaus J. Bachmann OriginalPaper 29 November 2013 Pages: 49 - 55
Journal of Materials Research Editor’s Report Robert A. Laudise EditorialNotes 29 November 2013 Pages: 60 - 60
The Application of Quantum Theory to Explain the Effects of Various Management Practices on Basic Research E. N. Kaufmann OriginalPaper 29 November 2013 Pages: 80 - 80