Multivariate analysis of PECVD data V. Dose Plasma-Enhanced Chemical Vapor Deposition Pages: 471 - 477
In-situ diagnostics for plasma surface processing G. M. W. KroesenF. J. de Hoog Plasma-Enhanced Chemical Vapor Deposition Pages: 479 - 492
Plasma deposition of hydrogenated amorphous silicon: Studies of the growth surface J. R. Abelson Plasma-Enhanced Chemical Vapor Deposition Pages: 493 - 512
Chemical vapor deposition of diamond C.-P. Klages Plasma-Enhanced Chemical Vapor Deposition Pages: 513 - 526
Plasma and surface modeling of the deposition of hydrogenated carbon films from low-pressure methane plasmas W. Möller Plasma-Enhanced Chemical Vapor Deposition Pages: 527 - 546
Electrical characterization of defects introduced in n-GaAs by alpha and beta irradiation from radionuclides F. D. AuretS. A. GoodmanW. E. Meyer Solids And Materials Pages: 547 - 553
Radiation-enhanced diffusion in ion-implanted glass D.-E. ArafahY. Al-Ramadin Solids And Materials Pages: 555 - 559
Monte-Carlo study of reactive ion-beam assisted film growth X. WangY. ChenS. Zou Surfaces And Multilayers Pages: 561 - 565
Auger recombination with traps in quantum-well semiconductors A. Haug Surfaces And Multilayers Pages: 567 - 569
Raman spectroscopy of macroscopic defects of GaAs grown by molecular beam epitaxy H. S. JangH. Y. ChoJ. Yang Surfaces And Multilayers Pages: 571 - 574
Computer simulation of the small-signal admittance and negative resistance of double avalanche region IMPATT diodes J. P. BanerjeeS. K. Roy Surfaces And Multilayers Pages: 575 - 580