The driving force for development of IC and system in future: Reducing the power consumption and improving the ratio of performance to power consumption YangYuan Wang Special Issue 05 May 2011 Pages: 915 - 935
Advanced strain engineering for state-of-the-art nanoscale CMOS technology Bin (Frank) YangMing Cai Special Issue 05 May 2011 Pages: 946 - 958
Next-generation lithography for 22 and 16 nm technology nodes and beyond Banqiu Wu Special Issue 05 May 2011 Pages: 959 - 979
Inelastic electron tunneling spectroscopy (IETS) study of high-k gate dielectrics T. P. Ma Special Issue 05 May 2011 Pages: 980 - 989
Ultra-thin films and multigate devices architectures for future CMOS scaling Simon Deleonibus Special Issue 05 May 2011 Pages: 990 - 1003
Si nanowire FET and its modeling Hiroshi IwaiKenji NatoriParhat Ahmet Special Issue 05 May 2011 Pages: 1004 - 1011
3D integration review Mukta G. FarooqSubramanian S. Iyer Special Issue 05 May 2011 Pages: 1012 - 1025
RF/wireless-interconnect: The next wave of connectivity SaiWang TamMau-Chung Frank Chang Special Issue 05 May 2011 Pages: 1026 - 1038
State-of-the-art flash memory devices and post-flash emerging memories ChihYuan LuHangTing LueYiChou Chen Special Issue 05 May 2011 Pages: 1039 - 1060
Resistance switching for RRAM applications Frederick T. ChenHengYuan LeeRu Huang Special Issue 05 May 2011 Pages: 1073 - 1086
High power devices in wide bandgap semiconductors Mikael Östling Special Issue 05 May 2011 Pages: 1087 - 1093
Low power 3.1–10.6 GHz IR-UWB transmitter for Gbps wireless communications Xin WangLin LinGary Zhang Special Issue 05 May 2011 Pages: 1094 - 1102