Features of the Current Flow in Injection Structures Based on PbSnTe:In Films D. V. IshchenkoI. G. NeizvestnyiV. N. Sherstyakova OriginalPaper 04 July 2018 Pages: 221 - 225
A Thin-Film Platform for Chemical Gas Sensors I. V. RoslyakovK. S. NapolskiiV. N. Surtaev OriginalPaper 04 July 2018 Pages: 226 - 233
Structuring Copper in the Plasma Medium of a High-Frequency Discharge A. V. DunaevD. B. Murin OriginalPaper 04 July 2018 Pages: 234 - 238
On the Effect of the Ratio of Concentrations of Fluorocarbon Components in a CF4 + C4F8 + Ar Mixture on the Parameters of Plasma and SiO2/Si Etching Selectivity A. M. EfremovD. B. MurinK.-H. Kwon OriginalPaper 04 July 2018 Pages: 239 - 246
The Effect of the Mixture Composition on the Electrophysical Parameters of HCl/N2 Plasma S. A. Pivovarenok OriginalPaper 04 July 2018 Pages: 247 - 250
Effect of the Distribution of the Radiation Defect on the Field-Emission Properties of Silicon Crystals R. K. YafarovV. P. Timoshenkov OriginalPaper 04 July 2018 Pages: 251 - 258
Simulation of the Characteristics of Double-Gate Asymmetrically Doped SOI CMOS Nanotransistors N. V. Masalsky OriginalPaper 04 July 2018 Pages: 259 - 267
Quantum Gates with Spin States in Continuous Microwave Field A. F. ZinovievaA. V. NenashevA. V. Dvurechenskii OriginalPaper 04 July 2018 Pages: 268 - 278