1. Formation of the nickel-platinum alloy silicide Schottky barriers

   • V. A. Solodukha
   • A. S. Turtsevich
   • S. V. Gaponenko

   OriginalPaper 30 January 2014 Pages: 1 - 8

2. Investigation of the GaAs surface after etching in the plasma of mixtures HCl/Ar, HCl/Cl₂, and HCl/H₂ by atomic-force microscopy

   • A. V. Dunaev

   OriginalPaper 30 January 2014 Pages: 9 - 14

3. A distribution of Ga⁺ ions in a silicon substrate for nano-dimensional masking

   • I. I. Bobrinetskii
   • V. K. Nevolin
   • A. A. Chudinov

   OriginalPaper 30 January 2014 Pages: 15 - 20

4. Assembly of 3D-wares with the use of wire leadouts

   • V. V. Zenin
   • A. A. Stoyanov
   • S. Yu. Chistyakov

   OriginalPaper 30 January 2014 Pages: 21 - 33

5. Effect of HF discharge structure on etch nonuniformity in plasma-chemical reactor

   • Yu. N. Grigor’ev
   • A. G. Gorobchuk

   OriginalPaper 30 January 2014 Pages: 34 - 41

6. Formation and dielectric properties of nanolayers of tantalum and aluminum oxides

   • Yu. K. Ezhovskii

   OriginalPaper 30 January 2014 Pages: 42 - 48

7. Simulation of spatially-heterogeneous oxygen precipitation in silicon with allowance for internal mechanical stresses

   • R. V. Goldshtein
   • T. M. Makhviladze
   • M. E. Sarychev

   OriginalPaper 30 January 2014 Pages: 49 - 56

8. A semianalytical model of a nanowire-based field-effect transistor

   • A. N. Khomyakov
   • V. V. V’yurkov

   OriginalPaper 30 January 2014 Pages: 57 - 71

9. A modifying algorithm of the topological VLSI layer by dummy filling features based on modeling the chemical-mechanical planarization

   • A. V. Amirkhanov
   • A. A. Gladkykh
   • V. A. Shakhnov

   OriginalPaper 30 January 2014 Pages: 72 - 79

10. Micro systems engineering and digital holographic flash memory

    • V. A. Zhukov

    OriginalPaper 30 January 2014 Pages: 80 - 90