Plasma parameters and etching mechanisms of metals and semiconductors in hydrogen chloride A. M. EfremovS. A. PivovarenokV. I. Svettsov Plasma Processing 17 May 2009 Pages: 147 - 159
Obtaining multicomponent films by the plasma-stimulated method V. F. BochkarevV. V. Ovcharov Plasma Processing 17 May 2009 Pages: 160 - 164
The effect of electromagnetic fields on the process of formation of ultrathin Fe-Ni films during their deposition under a plasma-stimulated deposition V. F. BochkarevE. Yu. Buchin Plasma Processing 17 May 2009 Pages: 165 - 170
Mathematical simulation of an inclined neutralization channel for a plasma source of neutral beams A. V. DegtyarevV. P. KudryaYu. P. Maishev Modeling and Simulation 17 May 2009 Pages: 171 - 179
A study of the magnetic characteristics of permalloy nanostructures by micromagnetic simulation O. S. TrushinN. BarabanovaV. P. Alekseev Modeling and Simulation 17 May 2009 Pages: 180 - 185
Analysis of the dipole matrix elements of electronic optical transitions in the P 2 + /Si system A. N. Voron’ko Modeling and Simulation 17 May 2009 Pages: 186 - 198
The computable measure of quantum entanglement of multiqubit states A. Yu. Chernyavskiy Quantum-Computing Devices 17 May 2009 Pages: 199 - 205
The design of ternary logic units on the basis of the standard MOS technology D. V. MorozovM. M. PilipkoA. S. Korotkov Circuit Analysis and Synthesis 17 May 2009 Pages: 206 - 218
Flip-flop device with state actuation N. M. Saf’yannikovP. N. Bondarenko Circuit Analysis and Synthesis 17 May 2009 Pages: 219 - 222