New method for the Langmuir probe diagnostics of polymerizing plasmas K. V. RudenkoA. V. Myakon’kikhA. N. Pustovit Plasma Diagnostics Pages: 14 - 26
Nitrogen concentration in ZnO films grown by magnetron sputtering in an Ar-NO plasma O. V. KononenkoY. S. NohW. K. Choi Process Technologies Pages: 27 - 32
Dopant diffusion dynamics and optimal diffusion time as influenced by diffusion-coefficient nonuniformity E. L. Pankratov Process Technologies Pages: 33 - 39
Enhancing the dry-etch durability of photoresist masks: A review of the main approaches S. V. ZelentsovN. V. ZelentsovaI. A. Mashtakov Process Technologies Pages: 40 - 48
Void transformation and dopant distribution in porous silicon A. A. KovalevskiiA. V. DolbikM. V. Tarasikov Process Technologies Pages: 49 - 52
Radiation-enhanced thermal oxidation of silicon A. B. SimakovA. Yu. Bashin Process Technologies Pages: 53 - 55
Linear and nonlinear modeling of switched-capacitor ΔΣ modulators A. S. KorotkovM. V. Telenkov Circuit Analysis and Synthesis Pages: 56 - 66