CVD diamond coating of AlN ceramic substrates to enhance heat removal V. G. RalchenkoA. V. SavelievE. E. Ashkinazi Materials and Microstructure Characterization Pages: 205 - 209
Degradation pattern of thin HfO2 films on Si(100) under ultrahigh-vacuum annealing: An investigation by x-ray photoelectron spectroscopy and low-energy ion scattering A. V. ZenkevichY. Y. LebedinskiiM. Fanciulli Materials and Microstructure Characterization Pages: 210 - 215
Periodically doped MOSFET structure V. Ya. UritskyA. Yu. Savenko Process Technologies Pages: 216 - 221
Influence of defects in gate-oxide peripheral regions on the electrical characteristics of MOS structures A. Yu. SavenkoV. Ya. UritskyV. V. Hramthzov Process Technologies Pages: 222 - 234
Testing the electromigration resistance of Al metallization patterns by electrical-resistance measurement M. I. GorlovV. I. PlebanovichA. V. Strogonov Process Technologies Pages: 235 - 242
Integrated receivers for wireless communications: A review A. S. Korotkov Circuit Analysis and Synthesis Pages: 243 - 261
PRALU-to-VHDL conversion of parallel-algorithm descriptions for control units P. N. Bibilo Circuit Analysis and Synthesis Pages: 262 - 275