Borophosphosilicate glass films in silicon microelectronics, part 2: Structure and applications V. Y. Vasilev VLSI Technology Pages: 67 - 77
n-AlGaAs/GaAs/n-AlGaAs double quantum wells with an AlAs barrier: Relating the cladding doping level to structural and transport properties I. S. Vasil’evskiiG. B. GalievM. A. Chuev Process Technologies Pages: 78 - 87
IPL resistless lithography as a method for delta-doping of monocrystalline semiconductors by Al and Sb implantation V. A. Zhukov Process Technologies Pages: 88 - 94
Diffraction ellipsometric measurement of step height on wafer surfaces E. S. GornevE. S. Lonskii Materials and Microstructure Characterization Pages: 95 - 102
Theory of the vacuum nanotriode, part 1: Explaining the results of an experiment V. A. Zhukov Micro- and Nanoelectronic Devices Pages: 103 - 110
Lifetime prediction for submicrometer LSI circuits and programmable logic: An overview A. V. Strogonov Circuit Analysis and Synthesis Pages: 111 - 129