Noncontact temperature measurement on dielectrics and semiconductors, part 2 V. K. BitukovV. A. Petrov Materials and Microstructure Characterization Pages: 1 - 17
Short-circuited double Langmuir probe as a model of a conducting wafer under plasma processing A. F. AleksandrovV. A. RiabyV. G. Yakunin Materials and Microstructure Characterization Pages: 18 - 21
Parts screening for ESD susceptibility M. I. GorlovV. A. Emel’yanovD. Yu. Smirnov Materials and Microstructure Characterization Pages: 22 - 29
MBE growth of silicon films on diamond substrates V. Y. KarasevV. D. KryukovL. V. Sokolov Process Technologies Pages: 30 - 35
Defect formation in epitaxial GaP junctions under heat treatment S. V. BoulyrskiiN. S. GroushkoD. V. Kazakov Process Technologies Pages: 36 - 42
Combined effect of V2O5 and NH3 on thermal oxidation of InP I. Ya. MittovaS. S. LavrushinaM. V. Sycheva Process Technologies Pages: 43 - 46
Magnetic nanostructures and nanodevices with a semiconductor or dielectric spacer S. I. KasatkinA. M. Murav’jevV. D. Khodzhaev Micro- and Nanoelectronic Devices Pages: 47 - 53
MOS integrated piezoresistive microsensors V. P. Dragunov Micro- and Nanoelectronic Devices Pages: 54 - 60
Microprocessor structure in relation to on-chip interconnection characteristics G. V. KristovskiiYu. I. Terent’ev Circuit Analysis and Synthesis Pages: 61 - 65