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2. In situDiagnostics of Plasma Processes in Microelectronics: The Current Status and Immediate Prospects. Part I.

   • A. A. Orlikovskii
   • K. V. Rudenko

   OriginalPaper Pages: 69 - 87

3. Formation of Local Insulating Regions by Stain Mask Etching

   • V. V. Starkov
   • E. A. Starostina
   • A. F. Vyatkin

   OriginalPaper Pages: 88 - 93

4. Promising CMOS ICs Based on Si/CaF2/Si Epitaxial Layers

   • A. A. Altukhov
   • A. Yu. Mityagin

   OriginalPaper Pages: 94 - 98

5. InAs/Si-Based Quantum-Dot Heterostructures for New-Generation Optoelectronic and Microelectronic Devices

   • V. N. Petrov
   • G. E. Tsyrlin
   • D. Bimberg

   OriginalPaper Pages: 99 - 105

6. GaAs Thermal Oxidation by Introducing CrO3 into a Gaseous Oxidizer

   • I. Ya. Mittova
   • V. V. Pukhova
   • A. A. Emel'yanova

   OriginalPaper Pages: 106 - 110

7. Deep Traps in ZnxCd1 – xTe(Cl) Solid Solutions

   • A. A. Glebkin
   • T. S. Kitichenko
   • V. A. Chapnin

   OriginalPaper Pages: 111 - 117

8. Digital Simulation of Fractal Measurements

   • P. A. Arutyunov

   OriginalPaper Pages: 118 - 124

9. Gerentology of Silicon Integrated Circuits

   • M. I. Gorlov
   • A. V. Strogonov

   OriginalPaper Pages: 125 - 136